SCHEMBL13063848

SCHEMBL13063848

C=C/C=C1C(=C/C)\C(=O)c2ccccc2\1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.44
ALDH1A1 P00352 6/20 0.44
HTT P42858 4/20 0.44
SMN1; SMN2 Q16637 3/20 0.44
HIF1A Q16665 3/20 0.44
KMT2A Q03164 6/20 0.43
POLB P06746 4/20 0.43
MEN1 O00255 3/20 0.43
RAB9A P51151 3/20 0.43
THRB P10828 2/20 0.43
MAPK1 P28482 2/20 0.43
RECQL P46063 2/20 0.43
NPSR1 Q6W5P4 2/20 0.43
NPC1 O15118 2/20 0.43
KDM4E B2RXH2 2/20 0.43
LMNA P02545 2/20 0.43
S100A4 P26447 2/20 0.43
BLM P54132 2/20 0.43
CES2 O00748 1/20 0.43
APAF1 O14727 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19336218 0.94 MAPT (0.46) MAPTALDH1A1HTTSMN1; SMN2HIF1A
SCHEMBL12719742 0.87 S100A4 (0.46) MAPTALDH1A1HTTSMN1; SMN2HIF1A
SCHEMBL19067985 0.84 MAPT (0.55) MAPTALDH1A1HTTSMN1; SMN2HIF1A
SCHEMBL23095433 0.84 MAPT (0.54) MAPTALDH1A1HTTSMN1; SMN2HIF1A
SCHEMBL14431153 0.84 MAPT (0.58) MAPTALDH1A1HTTSMN1; SMN2HIF1A
SCHEMBL19474583 0.80 MAOA (0.46) POLBMAOA
SCHEMBL1104624 0.80 MAPT (0.58) MAPTALDH1A1HTTSMN1; SMN2HIF1A
SCHEMBL19336216 0.78 MAPT (0.52) MAPTALDH1A1HTTSMN1; SMN2HIF1A
SCHEMBL22644308 0.77
SCHEMBL21241093 0.76 MAPT (0.46) MAPTALDH1A1HTTSMN1; SMN2HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3394674-B1 NEGATIVE-WORKING PHOTORESIST COMPOSITIONS FOR LASER ABLATION AND PROCESSES USING THEM AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) 2020-05-06 EP disclosed
EP-3511774-A1 NEGATIVE-WORKING PHOTORESIST COMPOSITION FOR LASER ABLATION AND PROCESS USING IT AZ Electronic Materials Luxembourg S.à.r.l. (LU) 2019-07-17 EP disclosed
EP-2249411-A1 LAYERED STRUCTURE Sumitomo Chemical Company, Limited (JP) 2010-11-10 EP disclosed