SCHEMBL13080656

SCHEMBL13080656

C=C(C)C(=O)Oc1ccc(C(c2ccccc2)(c2ccccc2)S(=O)(=O)C(F)(F)COC(=O)C2CCCCC2)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.39
POLB P06746 1/20 0.39
ATM Q13315 1/20 0.35
MAPT P10636 5/20 0.34
ALDH1A1 P00352 5/20 0.34
KMT2A Q03164 2/20 0.34
MEN1 O00255 1/20 0.34
CYP2C19 P33261 1/20 0.34
L3MBTL1 Q9Y468 1/20 0.33
HTT P42858 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
NPSR1 Q6W5P4 2/20 0.33
LMNA P02545 1/20 0.33
HTR1E P28566 1/20 0.33
S1PR3 Q99500 1/20 0.33
USP2 O75604 1/20 0.33
TSHR P16473 1/20 0.33
HSD17B10 Q99714 1/20 0.33
PKM P14618 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13080640 0.84 ELANE (0.36) ELANEATMMAPTALDH1A1KMT2A
SCHEMBL13080654 0.83 ATM (0.40) ELANEPOLBATMMAPTALDH1A1
SCHEMBL3454245 0.83 ELANE (0.38) ELANEPOLBMAPTALDH1A1KMT2A
SCHEMBL13080652 0.82 ELANE (0.48) ELANEATMMAPTALDH1A1KMT2A
SCHEMBL13080646 0.82 ELANE (0.43) ELANEPOLBATMMAPTKMT2A
SCHEMBL13080650 0.81 ELANE (0.38) ELANEPOLBMAPTALDH1A1KMT2A
SCHEMBL3756010 0.69 ALDH1A1 (0.38) ELANEPOLBATMMAPTALDH1A1
SCHEMBL4351667 0.69 MEN1 (0.46) ATMMAPTALDH1A1KMT2AMEN1
SCHEMBL3756015 0.68 MEN1 (0.44) ELANEPOLBATMMAPTALDH1A1
SCHEMBL13374670 0.67 ELANE (0.64) ELANEPOLBATMMAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8283102-B2 Photoacid generator, copolymer, chemically amplified resist composition, and method of forming pattern using the chemically amplified resist composition KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) 2012-10-09 US disclosed
US-20100143843-A1 PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION KOREA KUMHO PETROCHEMICAL CO., LTD. 2010-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143843-A1 PHOTOACID GENERATOR, COPOLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND METHOD OF FORMING PATTERN USING THE CHEMICALLY AMPLIFIED RESIST COMPOSITION POLL, PARG, POLH ELANE 1905/4885POLB 6/4885ATM 2996/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.