SCHEMBL13100740

SCHEMBL13100740

CC1(OC(=O)CCCOC(=O)C(F)(F)SOOO)C2CC3CC(C2)CC1C3

nearest known ligand 0.34

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 2/20 0.34
CYP19A1 P11511 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13100742 0.97 CYP17A1 (0.34) CYP17A1CYP19A1
SCHEMBL13100745 0.96 CYP17A1 (0.33) CYP17A1CYP19A1
SCHEMBL13100744 0.96 CYP17A1 (0.33) CYP17A1CYP19A1
SCHEMBL13100743 0.96 CYP17A1 (0.33) CYP17A1CYP19A1
SCHEMBL13100741 0.93 CYP17A1 (0.35) CYP17A1CYP19A1
SCHEMBL2602902 0.86 CYP17A1 (0.37) CYP17A1CYP19A1
SCHEMBL12357063 0.83 CYP17A1 (0.39) CYP17A1CYP19A1
SCHEMBL2602950 0.82 CYP17A1 (0.41) CYP17A1CYP19A1
SCHEMBL2602921 0.80 CYP17A1 (0.37) CYP17A1CYP19A1
SCHEMBL12357062 0.79 CYP17A1 (0.38) CYP17A1CYP19A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100273113-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-10-28 US disclosed