Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 2/20 | 0.33 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 9/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13100745 | 1.00 | CYP17A1 (0.33) | CYP17A1CYP19A1EPHX2 | |
| SCHEMBL13100743 | 1.00 | CYP17A1 (0.33) | CYP17A1CYP19A1EPHX2 | |
| SCHEMBL13100742 | 0.99 | CYP17A1 (0.34) | CYP17A1CYP19A1EPHX2 | |
| SCHEMBL13100740 | 0.96 | CYP17A1 (0.34) | CYP17A1CYP19A1 | |
| SCHEMBL13100741 | 0.91 | CYP17A1 (0.35) | CYP17A1CYP19A1 | |
| SCHEMBL2602902 | 0.85 | CYP17A1 (0.37) | CYP17A1CYP19A1 | |
| SCHEMBL12357066 | 0.83 | CYP17A1 (0.37) | CYP17A1CYP19A1EPHX2 | |
| SCHEMBL12357060 | 0.83 | CYP17A1 (0.37) | CYP17A1CYP19A1EPHX2 | |
| SCHEMBL12357061 | 0.83 | CYP17A1 (0.37) | CYP17A1CYP19A1EPHX2 | |
| SCHEMBL12357062 | 0.82 | CYP17A1 (0.38) | CYP17A1CYP19A1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100273113-A1 | PROCESS FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-10-28 | — | — | US | disclosed |