SCHEMBL13101718

SCHEMBL13101718

CC(=O)OCc1ccc2c3c(cccc13)CC2

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 10/20 0.54
KDM4E B2RXH2 9/20 0.54
HPGD P15428 6/20 0.54
LMNA P02545 3/20 0.47
POLB P06746 2/20 0.43
GAA P10253 2/20 0.43
MAPT P10636 6/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
CYP1A2 P05177 2/20 0.42
CYP2C19 P33261 2/20 0.42
NPC1 O15118 2/20 0.42
RAB9A P51151 2/20 0.42
HSD17B10 Q99714 2/20 0.40
HTT P42858 1/20 0.40
CYP3A4 P08684 1/20 0.40
ALOX15 P16050 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18603037 0.94 ALDH1A1 (0.48) ALDH1A1KDM4EHPGDLMNAPOLB
SCHEMBL19102304 0.85 KDM4E (0.48) ALDH1A1KDM4EHPGDLMNAPOLB
SCHEMBL18826311 0.79 KDM4E (0.47) ALDH1A1KDM4EHPGDLMNAPOLB
SCHEMBL9685109 0.78 ALDH1A1 (0.53) ALDH1A1KDM4ELMNAMAPTMEN1
SCHEMBL23228307 0.77 KDM4E (0.44) ALDH1A1KDM4EHPGDMAPTMEN1
SCHEMBL2513252 0.77 ALDH1A1 (0.42) ALDH1A1KDM4ELMNAMAPTMEN1
SCHEMBL5376065 0.77 ALDH1A1 (0.53) ALDH1A1KDM4EHPGDLMNAPOLB
SCHEMBL2518102 0.76 ALDH1A1 (0.41) ALDH1A1KDM4EMAPTMEN1KMT2A
SCHEMBL9883394 0.75 KMT2A (0.53) ALDH1A1KDM4EHPGDPOLBMAPT
SCHEMBL9891402 0.75 LMNA (0.46) ALDH1A1KDM4EHPGDLMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10023674-B2 Monomer, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-07-17 US disclosed
US-20170226252-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-10 US disclosed
US-8658332-B2 Photopolymer media with enhanced dynamic range AKONIA HOLOGRAPHICS, LLC (US) 2014-02-25 US disclosed
US-20130059233-A1 PHOTOPOLYMER MEDIA WITH ENHANCED DYNAMIC RANGE AKONIA HOLOGRAPHICS, LLC (US) 2013-03-07 US disclosed
US-20130059233-A1 PHOTOPOLYMER MEDIA WITH ENHANCED DYNAMIC RANGE AKONIA HOLOGRAPHICS, LLC (US) 2013-03-07 US disclosed
US-8323854-B2 Photopolymer media with enhanced dynamic range AKONIA HOLOGRAPHICS, LLC (US) 2012-12-04 US disclosed
US-8323854-B2 Photopolymer media with enhanced dynamic range AKONIA HOLOGRAPHICS, LLC (US) 2012-12-04 US disclosed
US-20100273096-A1 PHOTOPOLYMER MEDIA WITH ENHANCED DYNAMIC RANGE INPHASE TECHNOLOGIES, INC. (US) 2010-10-28 US disclosed
US-20100273096-A1 PHOTOPOLYMER MEDIA WITH ENHANCED DYNAMIC RANGE INPHASE TECHNOLOGIES, INC. (US) 2010-10-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10023674-B2 Monomer, polymer, resist composition, and patterning process PARG, SMARCA1, SMARCA2 ALDH1A1 3957/4885KDM4E 1041/4885HPGD 4089/4885
US-20170226252-A1 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS PARG, SMARCA1, SMARCA2 ALDH1A1 3957/4885KDM4E 1041/4885HPGD 4089/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.