SCHEMBL5437290

SCHEMBL5437290

CC(C)(C)OC(=O)C1C2CC3CC1CC(C(=O)OC(C)(C)C)(C3)C2

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP17A1 P05093 2/20 0.43
CYP19A1 P11511 2/20 0.43
HSD11B1 P28845 8/20 0.41
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
MAPK1 P28482 1/20 0.36
DGAT1 O75907 1/20 0.35
SCN1A P35498 1/20 0.34
SCN2A Q99250 1/20 0.34
SCN3A Q9NY46 1/20 0.34
EPHX2 P34913 1/20 0.34
KDM4E B2RXH2 1/20 0.34
ALDH1A1 P00352 1/20 0.34
TP53 P04637 1/20 0.34
ATM Q13315 1/20 0.34
HSD11B2 P80365 4/20 0.34
GAA P10253 1/20 0.33
MAPT P10636 1/20 0.33
XBP1 P17861 1/20 0.33
LMNA P02545 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5440940 0.85 ALDH1A1 (0.41) CYP17A1CYP19A1HSD11B1MEN1KMT2A
SCHEMBL5437873 0.85 CYP17A1 (0.37) CYP17A1CYP19A1HSD11B1MEN1KMT2A
SCHEMBL131064 0.83 CYP17A1 (0.55) CYP17A1CYP19A1HSD11B1MEN1KMT2A
SCHEMBL23618714 0.83 CYP17A1 (0.43) CYP17A1CYP19A1HSD11B1MEN1KMT2A
SCHEMBL30798137 0.79 CYP17A1 (0.46) CYP17A1CYP19A1HSD11B1MEN1KMT2A
SCHEMBL17320298 0.77 SCN1A (0.37) CYP17A1CYP19A1HSD11B1SCN1ASCN2A
SCHEMBL18906446 0.77 CYP17A1 (0.42) CYP17A1CYP19A1HSD11B1MEN1KMT2A
SCHEMBL27541309 0.76 EPHX2 (0.39) HSD11B1MEN1KMT2AMAPK1EPHX2
SCHEMBL29680009 0.74 EPHX2 (0.38) HSD11B1MEN1KMT2AMAPK1EPHX2
SCHEMBL5836801 0.74 CYP17A1 (0.44) CYP17A1CYP19A1MEN1KMT2AMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070254247-A1 Radiation-sensitive resin composition YAMAMOTO MASAFUMI 2007-11-01 US disclosed
US-7005230-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-02-28 US disclosed
US-6800419-B2 FOR USE AS CHEMICALLY-AMPLIFIED RESIST FOR MICROFABRICATION UTILIZING DEEP ULTRAVIOLET RAYS AND EXHIBITS EXCELLENT FILM THICKNESS UNIFORMITY AND STORAGE STABILITY JSR CORPORATION (JP) 2004-10-05 US disclosed
US-20040146802-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-07-29 US disclosed
US-20030203307-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2003-10-30 US disclosed