Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | ITGA4 | P13612 | 1/20 | 0.38 |
| ▸ | PDK2 | Q15119 | 12/20 | 0.34 |
| ▸ | RIPK1 | Q13546 | 3/20 | 0.33 |
| ▸ | APEX1 | P27695 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13126124 | 0.80 | ALDH1A1 (0.38) | ALDH1A1MAPTITGA4PDK2RIPK1 | |
| SCHEMBL19335202 | 0.79 | ELANE (0.36) | ALDH1A1MAPTITGA4PDK2TDP1 | |
| SCHEMBL25834055 | 0.78 | ALDH1A1 (0.40) | ALDH1A1MAPTITGA4PDK2RIPK1 | |
| SCHEMBL13126137 | 0.76 | SLC6A1 (0.40) | ALDH1A1MAPTITGA4RIPK1APEX1 | |
| SCHEMBL13126131 | 0.75 | ALDH1A1 (0.35) | ALDH1A1MAPTITGA4PDK2RIPK1 | |
| SCHEMBL2777235 | 0.72 | ELANE (0.38) | ALDH1A1MAPTITGA4PDK2APEX1 | |
| SCHEMBL18826319 | 0.71 | MAPT (0.36) | ALDH1A1MAPTPDK2KDM4E | |
| SCHEMBL9610535 | 0.67 | ELANE (0.35) | ALDH1A1MAPTITGA4APEX1TDP1 | |
| SCHEMBL24602989 | 0.66 | CYP2C9 (0.46) | ALDH1A1MAPTPDK2TDP1 | |
| SCHEMBL10064127 | 0.66 | MEN1 (0.40) | ALDH1A1RIPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8450042-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-05-28 | — | — | US | disclosed |
| US-20100227274-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |