Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | KCNH3 | Q9ULD8 | 1/20 | 0.33 |
| ▸ | UCHL1 | P09936 | 1/20 | 0.33 |
| ▸ | USP30 | Q70CQ3 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13163237 | 0.73 | DDB1 (0.43) | SMN1; SMN2 | |
| SCHEMBL13163234 | 0.73 | KCNH3 (0.55) | TSHRSMN1; SMN2KCNH3MAPK1 | |
| SCHEMBL19886461 | 0.70 | TSHR (0.41) | TSHRKCNH3MAPK1 | |
| SCHEMBL12996674 | 0.68 | KDM4E (0.39) | TSHRSMN1; SMN2MAPK1 | |
| SCHEMBL13131079 | 0.68 | KDM4E (0.39) | TSHRSMN1; SMN2MAPK1 | |
| SCHEMBL13163221 | 0.67 | POLB (0.61) | SMN1; SMN2MAPK1 | |
| SCHEMBL13163225 | 0.66 | MAPT (0.34) | TSHRSMN1; SMN2MAPK1 | |
| SCHEMBL10188365 | 0.66 | HDAC8 (0.34) | TSHRKCNH3MAPK1 | |
| SCHEMBL13163210 | 0.66 | KCNH3 (0.39) | KCNH3 | |
| SCHEMBL12996635 | 0.65 | ELANE (0.40) | TSHRSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404427-B2 | Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition | FUJIFILM CORPORATION (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20100239978-A1 | PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST FILM USING THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-7749679-B2 | Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-07-06 | — | — | US | disclosed |
| US-20070148592-A1 | Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-06-28 | — | — | US | disclosed |