SCHEMBL13163237

SCHEMBL13163237

O=C(Nc1ccc([S+](c2ccccc2)c2ccccc2)cc1)C1CCOC1=O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ DDB1 Q16531 1/20 0.43
▸ CRBN Q96SW2 1/20 0.43
▸ MAPT P10636 3/20 0.42
▸ GAA P10253 2/20 0.42
▸ MEN1 O00255 2/20 0.42
▸ KMT2A Q03164 2/20 0.42
▸ GFER P55789 1/20 0.42
▸ CYP1A2 P05177 1/20 0.41
▸ RECQL P46063 1/20 0.41
▸ RAB9A P51151 3/20 0.41
▸ LMNA P02545 2/20 0.41
▸ HPGD P15428 2/20 0.40
▸ POLB P06746 4/20 0.40
▸ NPC1 O15118 2/20 0.40
▸ KDM4E B2RXH2 2/20 0.40
▸ SMN1; SMN2 Q16637 2/20 0.40
▸ TP53 P04637 1/20 0.40
▸ CASP3 P42574 1/20 0.40
▸ SENP7 Q9BQF6 1/20 0.40
▸ HTT P42858 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12996635 0.76 ELANE (0.40) MEN1KMT2ACYP1A2POLBKDM4E
SCHEMBL13163234 0.73 KCNH3 (0.55) RAB9ANPC1SMN1; SMN2
SCHEMBL13163233 0.73 TSHR (0.43) SMN1; SMN2
SCHEMBL13163221 0.69 POLB (0.61) MAPTGAAMEN1KMT2ACYP1A2
SCHEMBL14177750 0.69 MAPT (0.36) MAPTMEN1KMT2ACYP1A2RAB9A
SCHEMBL3669684 0.69 NAPRT (0.69) MAPTGAAMEN1KMT2ARAB9A
SCHEMBL8159995 0.68 MCL1 (0.51) MAPTGAAPOLBKDM4EHTT
SCHEMBL13131079 0.68 KDM4E (0.39) DDB1CRBNMAPTGAAMEN1
SCHEMBL12996674 0.68 KDM4E (0.39) DDB1CRBNMAPTGAAMEN1
SCHEMBL13163222 0.67 MAPK1 (0.53) MAPTGAACYP1A2HPGDPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404427-B2 Photosensitive composition, and pattern-forming method and resist film using the photosensitive composition FUJIFILM CORPORATION (JP) 2013-03-26 — — US disclosed
US-20100239978-A1 PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST FILM USING THE PHOTOSENSITIVE COMPOSITION FUJIFILM CORPORATION (JP) 2010-09-23 — — US disclosed
US-7749679-B2 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition FUJIFILM CORPORATION (JP) 2010-07-06 — — US disclosed
US-20070148592-A1 Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition FUJIFILM CORPORATION (JP) 2007-06-28 — — US disclosed
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