SCHEMBL1316670

SCHEMBL1316670

COC(=O)C(C)(C)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4303914 0.81 DGAT1 (0.46)
SCHEMBL5613311 0.78
SCHEMBL15139 0.73
SCHEMBL808799 0.73 DGAT1 (0.74)
SCHEMBL4328011 0.73
SCHEMBL1424791 0.73 DGAT1 (0.50)
SCHEMBL3886376 0.73 DGAT1 (0.50)
SCHEMBL19120602 0.73
SCHEMBL7516128 0.73
SCHEMBL5613325 0.73

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023162998-A1 COMPOSITION INCLUDING IODO COMPOUND AND USE FOR SAME 東ソー株式会社 2023-08-31 WO claimed
CN-113185469-B Method for modifying photoregulated diaryl dihydrophenazine 南京先进生物材料与过程装备研究院有限公司 2022-08-09 CN claimed
CN-113185469-A Method for modifying photoregulated diaryl dihydrophenazine 南京先进生物材料与过程装备研究院有限公司 2021-07-30 CN claimed
EP-4406979-B1 COMPOUND AND PRODUCTION METHOD FOR COMPOUND DENKA COMPANY LTD (JP) 2025-11-12 EP disclosed
US-20240400740-A1 COMPOUND AND METHOD OF PRODUCING THE COMPOUND DENKA COMPANY LIMITED (JP) 2024-12-05 US disclosed
EP-4406979-A1 COMPOUND AND PRODUCTION METHOD FOR COMPOUND Denka Company Limited (JP) 2024-07-31 EP disclosed
EP-3106472-B1 LIVING RADICAL POLYMERIZATION CATALYST, AND POLYMER PRODUCTION METHOD USING SAME UNIV KYOTO (JP) 2024-05-29 EP disclosed
CN-118076649-A Compound and method for producing the same 电化株式会社 2024-05-24 CN disclosed
CN-117412997-A Water-absorbent resin composition, and absorbent article using same 三大雅株式会社 2024-01-16 CN disclosed
WO-2023188719-A1 WATER-ABSORBING RESIN COMPOSITION, ABSORBER AND ABSORBENT ARTICLE OBTAINED USING SAME, AND METHOD FOR PRODUCING WATER-ABSORBING RESIN COMPOSITION SDPグローバル株式会社 2023-10-05 WO disclosed
WO-2023188633-A1 WATER-ABSORBABLE RESIN COMPOSITION, ABSORBER AND ABSORBENT ARTICLE EACH USING SAME, AND METHOD FOR PRODUCING WATER-ABSORBABLE RESIN COMPOSITION SDPグローバル株式会社 2023-10-05 WO disclosed
US-20070270521-A1 Transition metal compound, polymerization-initiator system comprising the same, and process for producing polymer SUMITOMO CHEMICAL COMPANY, LIMITED 2007-11-22 US disclosed
CN-101024659-A Transition metal compound, polymerization initiator system including same and polymer production method SUMITOMO CHEMICAL CO (JP) 2007-08-29 CN disclosed
CN-1984981-A Lubricating oil additive containing acrylic polymer and lubricating oil composition KURARAY CO (JP) 2007-06-20 CN disclosed
EP-1553117-B1 SOLID POLYMER ELECTROLYTE NIPPON SODA CO (JP) 2007-01-17 EP disclosed
US-20050256256-A1 Block polymer of polymethoxypolyethylene glycol monomethyl methacrylate and polystyrene; LiClO4 a lithium salt as electrolyte; living copolymerization, block polymerization; excellent thermal characteristics, physical characteristics, and ionic conductivity; secondary batteries NIPPON SODA CO., LTD (JP) 2005-11-17 US disclosed
CN-1668662-A Solid polymer electrolyte NIPPON SODA CO (JP) 2005-09-14 CN disclosed
EP-1553117-A1 SOLID POLYMER ELECTROLYTE NIPPON SODA CO., LTD. (JP) 2005-07-13 EP disclosed
US-6716918-B2 ATOM TRANSFER RADICAL POLYMERIZATION IN THE PRESENCE OF A REDOX CATALYST OF A TRANSITION METAL COMPLEX ALSO USING AN ORGANOHALOGEN OR HALOGENATED SULFONYL COMPOUND AS A POLYMERIZATION CATALYST MITSUBISHI CHEMICAL CORPORATION (JP) 2004-04-06 US disclosed
US-20020156196-A1 Methacrylate-based polymer and process for producing the same MITSUBISHI CHEMICAL CORPORATION (JP) 2002-10-24 US disclosed