SCHEMBL1317993

SCHEMBL1317993

C1CCCCC([C](C2CCCCCCCCC2)C2CCCCCCCCC2)CCCC1

nearest known ligand 0.53

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.53
CES1 P23141 1/20 0.53
MGLL Q99685 1/20 0.45
HDAC8 Q9BY41 1/20 0.43
HDAC6 Q9UBN7 1/20 0.43
NOS2 P35228 2/20 0.42
TSHR P16473 4/20 0.41
ALDH1A1 P00352 3/20 0.41
HSD11B1 P28845 3/20 0.36
EPHX1 P07099 1/20 0.35
RECQL P46063 1/20 0.35
HSD17B10 Q99714 1/20 0.33
HSD11B2 P80365 1/20 0.33
MAPK1 P28482 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28990391 1.00 CES2 (0.53) CES2CES1MGLLHDAC8HDAC6
SCHEMBL3227064 1.00 CES2 (0.53) CES2CES1MGLLHDAC8HDAC6
SCHEMBL3224880 1.00 CES2 (0.53) CES2CES1MGLLHDAC8HDAC6
SCHEMBL3231716 1.00 CES2 (0.53) CES2CES1MGLLHDAC8HDAC6
SCHEMBL2531344 1.00 CES2 (0.53) CES2CES1MGLLHDAC8HDAC6
SCHEMBL6250105 0.96 CES2 (0.50) CES2CES1MGLLHDAC8HDAC6
SCHEMBL3233671 0.96 CES2 (0.47) CES2CES1MGLLHDAC8HDAC6
SCHEMBL15911101 0.87 NOS2 (0.44) CES2CES1MGLLHDAC8HDAC6
SCHEMBL10482505 0.77 NOS2 (0.38) NOS2
SCHEMBL15703282 0.75 CES2 (0.53) CES2CES1MGLLHDAC8HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4094748-B1 DENTAL MATERIALS BASED ON REDOX SYSTEMS WITH OLIGOMERIC CUMOLHYDROPEROXIDE DERIVATIVES IVOCLAR VIVADENT AG (LI) 2023-09-20 EP claimed
CN-115443293-A Composition for encapsulating organic light emitting element and organic light emitting display device comprising same 索路思高新材料有限公司 2022-12-06 CN claimed
US-7186853-B2 Polymer compositions containing stabilizer compounds comprising tricyclodecylmethyl groups CROMPTON CORPORATION (US) 2007-03-06 US claimed
WO-2004108735-A2 POLYMER COMPOSITIONS CONTAINING STABILIZER COMPOUNDS COMPRISING TRICYCLODECILMETHYL GROUPS CHEMTURA CORPORATION (US) 2004-12-16 WO claimed
US-20040249030-A1 Polymer compositions containing stabilizer compounds comprising tricyclodecylmethyl groups ADDIVANT USA, LLC 2004-12-09 US claimed
CN-115443293-A Composition for encapsulating organic light emitting element and organic light emitting display device comprising same 索路思高新材料有限公司 2022-12-06 CN disclosed
CN-115044040-A Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern formation method 信越化学工业株式会社 2022-09-13 CN disclosed
CN-113527101-A Novel compound, polymer and method for producing same, photosensitive resin composition, method for forming pattern, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
CN-113527680-A Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
CN-113467186-A Photosensitive resin composition, cured film thereof, and color filter having the cured film 日铁化学材料株式会社 2021-10-01 CN disclosed
CN-110740875-A Tyre for vehicle wheels 株式会社普利司通 2020-01-31 CN disclosed
US-10251265-B2 Pregreg, film with resin, metal foil with resin, metal-clad laminate, and printed wiring board HITACHI CHEMICAL COMPANY, LTD. (JP) 2019-04-02 US disclosed
US-7186853-B2 Polymer compositions containing stabilizer compounds comprising tricyclodecylmethyl groups CROMPTON CORPORATION (US) 2007-03-06 US disclosed
US-20050164119-A1 Monomer having fluorine-containing acetalor ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same NEC CORPORATION (JP) 2005-07-28 US disclosed
WO-2004108735-A3 POLYMER COMPOSITIONS CONTAINING STABILIZER COMPOUNDS COMPRISING TRICYCLODECILMETHYL GROUPS CROMPTON CORP (US) 2005-01-27 WO disclosed
WO-2004108735-A2 POLYMER COMPOSITIONS CONTAINING STABILIZER COMPOUNDS COMPRISING TRICYCLODECILMETHYL GROUPS CHEMTURA CORPORATION (US) 2004-12-16 WO disclosed
WO-2004108735-A2 POLYMER COMPOSITIONS CONTAINING STABILIZER COMPOUNDS COMPRISING TRICYCLODECILMETHYL GROUPS CHEMTURA CORPORATION (US) 2004-12-16 WO disclosed
US-20040249030-A1 Polymer compositions containing stabilizer compounds comprising tricyclodecylmethyl groups ADDIVANT USA, LLC 2004-12-09 US disclosed
US-20040249030-A1 Polymer compositions containing stabilizer compounds comprising tricyclodecylmethyl groups ADDIVANT USA, LLC 2004-12-09 US disclosed
US-20040249030-A1 Polymer compositions containing stabilizer compounds comprising tricyclodecylmethyl groups ADDIVANT USA, LLC 2004-12-09 US disclosed