SCHEMBL1319590

SCHEMBL1319590

C=C(C)C(=O)Oc1ccc2cc(C(=O)O)ccc2c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.60
ELANE P08246 1/20 0.58
TDP1 Q9NUW8 2/20 0.51
POLB P06746 1/20 0.51
APEX1 P27695 1/20 0.51
HTT P42858 1/20 0.51
RARA P10276 3/20 0.47
RARB P10826 3/20 0.47
RARG P13631 3/20 0.47
ALDH1A1 P00352 2/20 0.44
GAA P10253 2/20 0.44
HSD17B10 Q99714 2/20 0.44
TSHR P16473 1/20 0.44
RAB9A P51151 1/20 0.44
KMT2A Q03164 3/20 0.43
ATM Q13315 1/20 0.43
MAPT P10636 2/20 0.42
MEN1 O00255 1/20 0.42
CYP26A1 O43174 1/20 0.42
CYP26B1 Q9NR63 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30337451 1.00 KDM4E (0.60) KDM4EELANETDP1POLBAPEX1
Hydrochloric Acid SCHEMBL1318956 0.98 KDM4E (0.58) KDM4EELANETDP1POLBAPEX1
SCHEMBL11963929 0.97 KDM4E (0.57) KDM4EELANETDP1POLBAPEX1
SCHEMBL30744223 0.90 ELANE (0.55) KDM4EELANETDP1POLBAPEX1
SCHEMBL30744224 0.90 ELANE (0.55) KDM4EELANETDP1POLBAPEX1
SCHEMBL27322408 0.90 ELANE (0.55) KDM4EELANETDP1POLBAPEX1
SCHEMBL803231 0.88 ELANE (0.56) KDM4EELANETDP1POLBHTT
SCHEMBL18932288 0.87 ELANE (0.54) KDM4EELANETDP1POLBAPEX1
SCHEMBL8840369 0.87 KDM4E (0.64) KDM4EELANETDP1POLBAPEX1
SCHEMBL11961792 0.86 ELANE (0.56) KDM4EELANETDP1ALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115916853-B Polymer, and photo-alignment film and retardation film using the same 大阪有机化学工业株式会社 2024-07-09 CN disclosed
CN-115916853-A Novel polymer, and photo-alignment film and retardation film using same 大阪有机化学工业株式会社 2023-04-04 CN disclosed
EP-2243813-B1 LIQUID CRYSTAL COMPOSITION CONTAINING POLYMERIZABLE COMPOUND, AND LIQUID CRYSTAL DISPLAY DEVICE COMPRISING THE LIQUID CRYSTAL COMPOSITION ADEKA CORP (JP) 2015-11-04 EP disclosed
EP-2243813-B1 LIQUID CRYSTAL COMPOSITION CONTAINING POLYMERIZABLE COMPOUND, AND LIQUID CRYSTAL DISPLAY DEVICE COMPRISING THE LIQUID CRYSTAL COMPOSITION ADEKA CORP (JP) 2015-11-04 EP disclosed
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-8507175-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-13 US disclosed
US-8283000-B2 Liquid crystal composition containing polymerizable compound and liquid crystal display using the liquid crystal composition ADEKA CORPORATION (JP) 2012-10-09 US disclosed
US-8283000-B2 Liquid crystal composition containing polymerizable compound and liquid crystal display using the liquid crystal composition ADEKA CORPORATION (JP) 2012-10-09 US disclosed
US-8283000-B2 Liquid crystal composition containing polymerizable compound and liquid crystal display using the liquid crystal composition ADEKA CORPORATION (JP) 2012-10-09 US disclosed
US-20120202158-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-08-09 US disclosed
US-8057985-B2 Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-11-15 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed
US-20110091812-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-04-21 US disclosed
CN-101952390-A liquid crystal composition containing polymerizable compound and liquid crystal display element using same ADEKA CORP 2011-01-19 CN disclosed
US-20100328601-A1 LIQUID CRYSTAL COMPOSITION CONTAINING POLYMERIZABLE COMPOUND AND LIQUID CRYSTAL DISPLAY USING THE LIQUID CRYSTAL COMPOSITION ADEKA CORPORATION (JP) 2010-12-30 US disclosed
US-20100328601-A1 LIQUID CRYSTAL COMPOSITION CONTAINING POLYMERIZABLE COMPOUND AND LIQUID CRYSTAL DISPLAY USING THE LIQUID CRYSTAL COMPOSITION ADEKA CORPORATION (JP) 2010-12-30 US disclosed
US-20100328601-A1 LIQUID CRYSTAL COMPOSITION CONTAINING POLYMERIZABLE COMPOUND AND LIQUID CRYSTAL DISPLAY USING THE LIQUID CRYSTAL COMPOSITION ADEKA CORPORATION (JP) 2010-12-30 US disclosed
EP-2243813-A1 LIQUID CRYSTAL COMPOSITION CONTAINING POLYMERIZABLE COMPOUND, AND LIQUID CRYSTAL DISPLAY ELEMENT COMPRISING THE LIQUID CRYSTAL COMPOSITION Adeka Corporation (JP) 2010-10-27 EP disclosed
EP-2243813-A1 LIQUID CRYSTAL COMPOSITION CONTAINING POLYMERIZABLE COMPOUND, AND LIQUID CRYSTAL DISPLAY ELEMENT COMPRISING THE LIQUID CRYSTAL COMPOSITION Adeka Corporation (JP) 2010-10-27 EP disclosed
US-20100055608-A1 POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100055608-A1 POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS ARSA, ACSL3, RAD54L KDM4E 3334/4885ELANE 3914/4885TDP1 4345/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.