SCHEMBL13199271

SCHEMBL13199271

CCC(C)(C)CCC(=O)OC1C2CC3C(=O)OC1C3C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19648661 0.89
SCHEMBL14489032 0.86
SCHEMBL9881048 0.85 NLRP3 (0.36)
SCHEMBL9925257 0.84
SCHEMBL20872104 0.83
SCHEMBL2603069 0.82 CHRM2 (0.31)
SCHEMBL13136786 0.82 PRKCA (0.30)
SCHEMBL47567 0.82
SCHEMBL12973911 0.82
SCHEMBL14489374 0.81

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7767378-B2 Mixing a blend of copolymers of identical structural units but have mutually different measured values for a contact angle; mixing conditions for plurality of copolymers are adjusted so that a measured value of a contact angle for said resist composition is no higher than 40 degrees to avoid defects TOKYO OHKA KOGYO CO., LTD. (JP) 2010-08-03 US disclosed
US-20090029288-A1 METHOD FOR PRODUCING RESIST COMPOSITION AND RESIST COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2009-01-29 US disclosed