⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16865927 | 1.00 | — | — | |
| SCHEMBL12304939 | 0.90 | MDH1 (0.34) | — | |
| SCHEMBL132001 | 0.90 | MDH1 (0.34) | — | |
| SCHEMBL18308571 | 0.90 | MDH1 (0.34) | — | |
| SCHEMBL11911041 | 0.88 | MDH1 (0.31) | — | |
| SCHEMBL11890188 | 0.88 | CYP17A1 (0.32) | — | |
| SCHEMBL11985998 | 0.87 | MDH1 (0.35) | — | |
| SCHEMBL133088 | 0.86 | GRIN2D (0.32) | — | |
| SCHEMBL107655 | 0.85 | CYP17A1 (0.32) | — | |
| SCHEMBL107271 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9052594-B2 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20150111154-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-04-23 | — | — | US | disclosed |
| US-20120058431-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |