Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MDH1 | P40925 | 1/20 | 0.35 |
| ▸ | MDH2 | P40926 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.34 |
| ▸ | DPP8 | Q6V1X1 | 3/20 | 0.32 |
| ▸ | DPP9 | Q86TI2 | 3/20 | 0.32 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.32 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.32 |
| ▸ | DPP4 | P27487 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | CNR1 | P21554 | 1/20 | 0.30 |
| ▸ | CNR2 | P34972 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18308571 | 0.97 | MDH1 (0.34) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL132001 | 0.97 | MDH1 (0.34) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL12304939 | 0.97 | MDH1 (0.34) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL13847331 | 0.91 | MDH1 (0.40) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL11966898 | 0.91 | HSD11B1 (0.38) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL13088075 | 0.88 | HSD11B1 (0.38) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL47540 | 0.88 | HSD11B1 (0.38) | MDH1MDH2HSD11B1DPP8DPP9 | |
| SCHEMBL14253578 | 0.87 | CYP17A1 (0.33) | MDH1MDH2CYP17A1CYP19A1 | |
| SCHEMBL132070 | 0.87 | — | — | |
| SCHEMBL16865927 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9429846-B2 | Pattern forming process and shrink agent | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-30 | — | — | US | disclosed |
| US-20160223904-A1 | REAGENT FOR ENHANCING GENERATION OF CHEMICAL SPECIES | TOYO GOSEI CO., LTD (JP) | 2016-08-04 | — | — | US | disclosed |
| US-20150086929-A1 | PATTERN FORMING PROCESS AND SHRINK AGENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-26 | — | — | US | disclosed |
| US-8652756-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-02-18 | — | — | US | disclosed |
| US-20130056654-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-07 | — | — | US | disclosed |
| US-8247159-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-08-21 | — | — | US | disclosed |