SCHEMBL13212296

SCHEMBL13212296

CCC(C)C(=O)NCc1cc(C)c(O)c(C)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.43
▸ MAPT P10636 1/20 0.43
▸ MAPK1 P28482 1/20 0.43
▸ ERCC1 P07992 2/20 0.43
▸ ERCC4 Q92889 2/20 0.43
▸ HPGD P15428 2/20 0.40
▸ PTGES O14684 1/20 0.40
▸ GAA P10253 2/20 0.40
▸ MEN1 O00255 2/20 0.40
▸ KMT2A Q03164 2/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ MME P08473 1/20 0.39
▸ NR3C1 P04150 1/20 0.39
▸ PGR P06401 1/20 0.39
▸ NR3C2 P08235 1/20 0.39
▸ CYP3A4 P08684 3/20 0.39
▸ CARM1 Q86X55 2/20 0.39
▸ PRMT6 Q96LA8 2/20 0.39
▸ TSHR P16473 2/20 0.39
▸ KDM4E B2RXH2 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14827285 0.83 LMNA (0.45) LMNAMAPTMAPK1ERCC1ERCC4
SCHEMBL16282571 0.78 LMNA (0.36) LMNAMAPTMAPK1ERCC1ERCC4
SCHEMBL13212291 0.77 LMNA (0.53) LMNAMAPTMAPK1ERCC1ERCC4
SCHEMBL15623780 0.77 MME (0.51) LMNAMAPTMAPK1ERCC1ERCC4
SCHEMBL5436067 0.75 KMT2A (0.47) LMNAMAPTHPGDMEN1KMT2A
SCHEMBL10283303 0.75 MME (0.65) LMNAMAPTMAPK1GAAMEN1
SCHEMBL10031574 0.75 MME (0.65) LMNAMAPTMAPK1GAAMEN1
SCHEMBL1516159 0.75 MME (0.65) LMNAMAPTMAPK1GAAMEN1
SCHEMBL12206001 0.73 MEN1 (0.37) ERCC1ERCC4MEN1KMT2AL3MBTL1
SCHEMBL25445337 0.72 HPGD (0.59) LMNAMAPTMAPK1HPGDGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9513547-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-12-06 — — US disclosed
US-20150147699-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-05-28 — — US disclosed
US-8383321-B2 Method for developing a printing plate precursor AGFA GRAPHICS, N.V. (BE) 2013-02-26 — — US disclosed
US-20100203458-A1 METHOD FOR DEVELOPING A PRINTING PLATE PRECURSOR AGFA GRAPHICS NV (BE) 2010-08-12 — — US disclosed
Send feedback