Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.34 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.34 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.34 |
| ▸ | PGR | P06401 | 1/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.34 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.34 |
| ▸ | HTR1A | P08908 | 1/20 | 0.34 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.34 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.34 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.34 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.34 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.34 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.34 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.34 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12101451 | 0.91 | THRB (0.52) | TSHRTHRBALDH1A1TDP1 | |
| SCHEMBL3267819 | 0.91 | TSHR (0.47) | TSHRTHRBALDH1A1 | |
| SCHEMBL13943431 | 0.86 | THRB (0.56) | TSHRTHRBALDH1A1HSD17B10TDP1 | |
| SCHEMBL7717191 | 0.86 | THRB (0.50) | TSHRTHRBALDH1A1CHRM1CHRM2 | |
| SCHEMBL17049497 | 0.85 | THRB (0.44) | TSHRTHRBALDH1A1 | |
| SCHEMBL5533901 | 0.85 | THRB (0.44) | TSHRTHRBALDH1A1 | |
| SCHEMBL1324055 | 0.84 | TSHR (0.41) | TSHRTHRBALDH1A1 | |
| SCHEMBL27388787 | 0.83 | TSHR (0.46) | TSHRTHRBALDH1A1SMN1; SMN2HSD17B10 | |
| SCHEMBL3855601 | 0.83 | TSHR (0.44) | TSHRTHRBALDH1A1TDP1 | |
| SCHEMBL8492857 | 0.82 | THRB (0.40) | TSHRTHRBALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11643489-B2 | (Meth)acrylic copolymer, polymer solution, polymer-containing composition, anti-fouling coating composition, and method for producing (meth)acrylic copolymer | MITSUBISHI CHEMICAL CORPORATION (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20180201797-A1 | (METH)ACRYLIC COPOLYMER, POLYMER SOLUTION, POLYMER-CONTAINING COMPOSITION, ANTI-FOULING COATING COMPOSITION, AND METHOD FOR PRODUCING (METH)ACRYLIC COPOLYMER | MITSUBISHI CHEMICAL CORPORATION (JP) | 2018-07-19 | — | — | US | disclosed |
| US-20180051179-A1 | ANTIFOULING COATING COMPOSITION | MITSUBISHI CHEMICAL CORPORATION (JP) | 2018-02-22 | — | — | US | disclosed |
| US-8378016-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-02-19 | — | — | US | disclosed |
| US-8298746-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-30 | — | — | US | disclosed |
| CN-101021683-B | Chemical-amplification positive photoresist composition | SUMITOMO CHEMICAL CO | 2012-01-04 | — | — | CN | disclosed |
| US-8062830-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-22 | — | — | US | disclosed |
| US-8057983-B2 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-11-15 | — | — | US | disclosed |
| US-20110165519-A1 | RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME | ANDO NOBUO | 2011-07-07 | — | — | US | disclosed |
| US-7932334-B2 | Resin suitable for an acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20100010129-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| CN-101614958-A | Chemical enlargement type positive corrosion-resisting agent composition | SUMITOMO CHEMICAL CO | 2009-12-30 | — | — | CN | disclosed |
| US-20090269695-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-10-29 | — | — | US | disclosed |
| CN-101566798-A | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2009-10-28 | — | — | CN | disclosed |
| CN-101566797-A | Chemically amplified positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2009-10-28 | — | — | CN | disclosed |
| US-20090263742-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-10-22 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| CN-101021683-A | Chemical-amplification positive photoresist composition | SUMITOMO CHEMICAL CO (JP) | 2007-08-22 | — | — | CN | disclosed |
| US-20070149702-A1 | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-06-28 | — | — | US | disclosed |
| US-5994025-A | MIXTURE OF POLYMER AND ACID GENERATOR | NEC CORPORATION (JP) | 1999-11-30 | — | — | US | disclosed |