Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | GLA | P06280 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
| ▸ | GPR35 | Q9HC97 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | HTR2A | P28223 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | SLC22A12 | Q96S37 | 3/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | ME2 | P23368 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7266222 | 1.00 | KDM4E (0.44) | KDM4EALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL4078029 | 0.86 | HTR2A (0.44) | KDM4EALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL7553093 | 0.84 | KDM4E (0.42) | KDM4EALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL7553086 | 0.84 | KDM4E (0.42) | KDM4EALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL7559410 | 0.81 | CYP1A2 (0.44) | KDM4EALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL766946 | 0.80 | SLC22A12 (0.43) | KDM4EALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL3904718 | 0.80 | ALOX5 (0.41) | KDM4EALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL28900271 | 0.78 | SLC22A12 (0.40) | KDM4EALDH1A1HPGDMEN1KMT2A | |
| SCHEMBL17595169 | 0.77 | TDP1 (0.53) | KDM4EALDH1A1MEN1KMT2ACYP1A2 | |
| SCHEMBL3555650 | 0.76 | CYP1A2 (0.43) | MEN1KMT2ACYP1A2L3MBTL1AKR1C3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 100 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110491542-B | Friction luminescence isotope battery | 深圳热电新能源科技有限公司 | 2023-03-17 | — | — | CN | claimed |
| EP-2742385-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | International Business Machines Corporation (US) | 2014-06-18 | — | — | EP | claimed |
| US-8715907-B2 | Developable bottom antireflective coating compositions for negative resists | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-06 | — | — | US | claimed |
| EP-1845415-B1 | Process for producing an image using a first minimum bottom antireflective coating composition | AZ ELECTRONIC MATERIALS USA (US) | 2014-04-30 | — | — | EP | claimed |
| US-8470633-B2 | Circuit architecture on an organic base and related manufacturing method | STMICROELECTRONICS S.R.L. (IT) | 2013-06-25 | — | — | US | claimed |
| US-20130040238-A1 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-14 | — | — | US | claimed |
| WO-2013023124-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-14 | — | — | WO | claimed |
| US-20110275018-A1 | CIRCUIT ARCHITECTURE ON AN ORGANIC BASE AND RELATED MANUFACTURING METHOD | STMICROELECTRONICS S.R.L. (IT) | 2011-11-10 | — | — | US | claimed |
| US-20080241564-A1 | CIRCUIT ARCHITECTURE ON AN ORGANIC BASE AND RELATED MANUFACTURING METHOD | STMICROELECTRONICS S.R.L. (IT) | 2008-10-02 | — | — | US | claimed |
| US-20070244248-A1 | Copolymers useful as demulsifiers and clarifiers | BAKER HUGHES INCORPORATED (US) | 2007-10-18 | — | — | US | claimed |
| EP-1466216-B1 | PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION | AZ ELECTRONIC MATERIALS USA (US) | 2006-07-26 | — | — | EP | claimed |
| EP-1309360-B1 | MEDICAMENT INCORPORATION MATRIX | SURMODICS INC (US) | 2006-04-19 | — | — | EP | claimed |
| EP-0808855-B1 | Fluorescent polymers and coating compositions | ROHM & HAAS (US) | 2002-07-17 | — | — | EP | claimed |
| US-6309790-B1 | ACRYLATED ESTER COPOLYMER | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2001-10-30 | — | — | US | claimed |
| US-5250395-A | Coating substrate with film of blocked polymer and aromatic dye, exposing to electromagnetic radiation, contacting with organometallic compound to form etch barrier, etching with reactive ions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-10-05 | — | — | US | claimed |
| US-12427714-B2 | Functionalized product fabricated from a resin comprising a functional component and a polymeric resin, and method of making the same | NATIONAL RESEARCH COUNCIL OF CANADA (CA) | 2025-09-30 | — | — | US | disclosed |
| EP-4588988-A1 | REACTIVE ADHESIVE TAPE, REACTIVE ADHESIVE TAPE SYSTEM, BONDED COMPOSITE, AND METHOD FOR ELECTRICALLY RELEASING THE BONDED COMPOSITE | TESA SE (DE) | 2025-07-23 | — | — | EP | disclosed |
| US-5250395-A | Coating substrate with film of blocked polymer and aromatic dye, exposing to electromagnetic radiation, contacting with organometallic compound to form etch barrier, etching with reactive ions | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1993-10-05 | — | — | US | disclosed |
| EP-0062611-B1 | PHOTOPOLYMERISATION PROCESS | CIBA-GEIGY AG (CH) | 1985-04-24 | — | — | EP | disclosed |
| EP-0062611-A2 | Photopolymerisation process | CIBA-GEIGY AG (CH) | 1982-10-13 | — | — | EP | disclosed |