Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC22A12 | Q96S37 | 7/20 | 0.43 |
| ▸ | SLC2A9 | Q9NRM0 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | AKR1C3 | P42330 | 3/20 | 0.38 |
| ▸ | MEN1 | O00255 | 2/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | GLA | P06280 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | AKR1C2 | P52895 | 2/20 | 0.37 |
| ▸ | BACE1 | P56817 | 1/20 | 0.37 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.37 |
| ▸ | XPO1 | O14980 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28900271 | 0.89 | SLC22A12 (0.40) | SLC22A12SLC2A9KDM4EALDH1A1MTNR1A | |
| SCHEMBL17595169 | 0.86 | TDP1 (0.53) | SLC22A12SLC2A9KDM4EALDH1A1MTNR1A | |
| SCHEMBL28900155 | 0.82 | MTNR1A (0.38) | KDM4EALDH1A1GAAMTNR1AAKR1C3 | |
| SCHEMBL7559410 | 0.81 | CYP1A2 (0.44) | SLC22A12SLC2A9KDM4EALDH1A1TDP1 | |
| SCHEMBL1324675 | 0.80 | KDM4E (0.44) | SLC22A12KDM4EALDH1A1GAAAKR1C3 | |
| SCHEMBL7266222 | 0.80 | KDM4E (0.44) | SLC22A12KDM4EALDH1A1GAAAKR1C3 | |
| SCHEMBL1497446 | 0.77 | KMT2A (0.52) | SLC22A12SLC2A9KDM4EALDH1A1MTNR1A | |
| SCHEMBL3555650 | 0.76 | CYP1A2 (0.43) | AKR1C3MEN1KMT2ACYP1A2 | |
| Hydrogen Peroxide SCHEMBL28103162 | 0.76 | KDM4E (0.47) | KDM4EALDH1A1GAAMTNR1ATDP1 | |
| Methacrylic Acid SCHEMBL25408174 | 0.75 | TDP1 (0.42) | KDM4EALDH1A1GAAMTNR1ATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024024687-A1 | PHOTOCURABLE COMPOSITION, CURED PRODUCT OF PHOTOCURABLE COMPOSITION, AND LIGHT EMITTING DISPLAY DEVICE | デンカ株式会社 | 2024-02-01 | — | — | WO | disclosed |
| US-11392037-B2 | Resist underlayer film forming composition containing silicone having cyclic amino group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2022-07-19 | — | — | US | disclosed |
| US-10703917-B2 | Coating compositions suitable for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-07-07 | — | — | US | disclosed |
| US-10174255-B2 | Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device | DAI NIPPON PRINTING CO., LTD. (JP) | 2019-01-08 | — | — | US | disclosed |
| EP-2216683-B1 | Substrates coated with an antireflective composition and a photoresist | ROHM & HAAS ELECT MAT (US) | 2018-11-14 | — | — | EP | disclosed |
| US-10017697-B2 | Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device | DAI NIPPON PRINTING CO., LTD. (JP) | 2018-07-10 | — | — | US | disclosed |
| US-10017696-B2 | Thermosetting composition with photo-alignment property, alignment layer, substrate with alignment layer, retardation plate, and device | DAI NIPPON PRINTING CO., LTD. (JP) | 2018-07-10 | — | — | US | disclosed |
| US-20170313889-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-11-02 | — | — | US | disclosed |
| US-9760006-B2 | Silicon-containing resist underlayer film forming composition having urea group | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9733564-B2 | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-08-15 | — | — | US | disclosed |
| US-20100304305-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING POLYMER HAVING NITROGEN-CONTAINING SILYL GROUP | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100297556-A1 | Coating compositions suitable for use with an overcoated photoresist | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-11-25 | — | — | US | disclosed |
| US-7838606-B2 | Production process of copolymer for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-11-23 | — | — | US | disclosed |
| US-20100291487-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION HAVING UREA GROUP | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| EP-2249204-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING CYCLIC AMINO GROUP | Nissan Chemical Industries, Ltd. (JP) | 2010-11-10 | — | — | EP | disclosed |
| EP-2216683-A2 | Coating compositions suitable for use with an overcoated photoresist | Rohm and Haas Electronic Materials, L.L.C. (US) | 2010-08-11 | — | — | EP | disclosed |
| EP-2196854-A1 | COMPOSITION CONTAINING POLYMER HAVING NITROGENOUS SILYL GROUP FOR FORMING RESIST UNDERLAYER FILM | Nissan Chemical Industries, Ltd. (JP) | 2010-06-16 | — | — | EP | disclosed |
| US-7663301-B2 | for use as robust red organic phosphors | GENERAL ELECTRIC COMPANY (US) | 2010-02-16 | — | — | US | disclosed |
| WO-2006076247-A2 | PHOSPHORESCENT FLUORENE, ANTHRACENE AND/OR THIOPHENE SUBSTITUTED METALLO- PORPHYRINS AND RELATED COMPOUNDS | GENERAL ELECTRIC COMPANY (US) | 2006-07-20 | — | — | WO | disclosed |
| US-20060152149-A1 | Porphyrin compositions | GENERAL ELECTRIC COMPANY (US) | 2006-07-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10703917-B2 | Coating compositions suitable for use with an overcoated photoresist | DHPS, HAAO, FTO | SLC22A12 2159/4885SLC2A9 2107/4885KDM4E 393/4885 |
| US-20170313889-A1 | COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST | DHPS, HAAO, FTO | SLC22A12 2159/4885SLC2A9 2107/4885KDM4E 393/4885 |
| US-20060152149-A1 | Porphyrin compositions | ACP1, MMS19, MVD | SLC22A12 1306/4885SLC2A9 3151/4885KDM4E 2546/4885 |
| US-20100297556-A1 | Coating compositions suitable for use with an overcoated photoresist | C5, FTO, DOHH | SLC22A12 3644/4885SLC2A9 2179/4885KDM4E 469/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.