SCHEMBL132586

SCHEMBL132586

Fc1c(F)c(F)c([B-](c2c(F)c(F)c(F)c(F)c2F)(c2c(F)c(F)c(F)c(F)c2F)c2c(F)c(F)c(F)c(F)c2F)c(F)c1F.c1ccc([I+]c2ccccc2)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrogen Sulfide SCHEMBL30375675 0.98
SCHEMBL21679593 0.94
SCHEMBL1155415 0.89 ACHE (0.34)
SCHEMBL2800597 0.89
SCHEMBL2800600 0.89
SCHEMBL1001144 0.84 CA4 (0.41)
SCHEMBL1001859 0.84 KDM1A (0.35)
SCHEMBL2579597 0.84 CA4 (0.41)
SCHEMBL1001860 0.84 KDM1A (0.35)
SCHEMBL1001143 0.84 CA4 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 958 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120082236-A Photo-curing epoxy ink and preparation method and application thereof 万华化学集团股份有限公司 2025-06-03 CN claimed
US-11635688-B2 Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates KAYAKU ADVANCED MATERIALS, INC. (US) 2023-04-25 US claimed
CN-114835996-B High-barrier blue liquid crystal film and preparation method thereof 广州光驭超材料有限公司 2022-12-13 CN claimed
CN-115267955-A Visual angle regulation and control film, preparation method thereof and printing roller 北京海川利元材料科技有限公司 2022-11-01 CN claimed
CN-114193896-B Thermochromic film and preparation method and application thereof 广州光驭超材料有限公司 2022-10-21 CN claimed
CN-114835996-A High-barrier blue liquid crystal film and preparation method thereof 广州光驭超材料有限公司 2022-08-02 CN claimed
CN-114193896-A Thermochromic film and preparation method and application thereof 广州光驭超材料有限公司 2022-03-18 CN claimed
US-10428214-B2 Cationically curable resin composition THREEBOND CO., LTD. (JP) 2019-10-01 US claimed
EP-2513722-B1 LED CURABLE LIQUID RESIN COMPOSITIONS FOR ADDITIVE FABRICATION, PROCESS FOR MAKING A THREE-DIMENSIONAL OBJECT USING THE SAME DSM IP ASSETS BV (NL) 2017-01-25 EP claimed
US-20150024326-A1 PHOTOIMAGEABLE COMPOSITIONS AND PROCESSES FOR FABRICATION OF RELIEF PATTERNS ON LOW SURFACE ENERGY SUBSTRATES KAYAKU ADVANCED MATERIALS, INC. 2015-01-22 US claimed
US-7122290-B2 Holographic storage medium GENERAL ELECTRIC COMPANY (US) 2006-10-17 US claimed
WO-2006096437-A1 HOLOGRAPHIC STORAGE MEDIUM, ARTICLE AND METHOD GENERAL ELECTRIC COMPANY (US) 2006-09-14 WO claimed
US-20060199081-A1 Holographic storage medium, article and method GENERAL ELECTRIC COMPANY 2006-09-07 US claimed
WO-2006009526-A1 PHOTOSENSITIVE RESIN COMPOSITION HAVING A HIGH REFRACTIVE INDEX CORNELL RESEARCH FOUNDATION, INC. (US) 2006-01-26 WO claimed
WO-2006001989-A1 HOLOGRAPHIC STORAGE MEDIUM GENERAL ELECTRIC COMPANY (US) 2006-01-05 WO claimed
US-20050277747-A1 Holographic storage medium MOMENTIVE PERFORMANCE MATERIALS INC. 2005-12-15 US claimed
WO-2005101396-A1 OPTICAL STORAGE MATERIALS FOR HOLOGRAPHIC RECORDING, METHODS OF MAKING THE STORAGE MATERIALS, AND METHODS FOR STORING AND READING DATA GENERAL ELECTRIC COMPANY (US) 2005-10-27 WO claimed
US-20050233246-A1 Novel optical storage materials, methods of making the storage materials, and methods for storing and reading data MOMENTIVE PERFORMANCE MATERIALS INC. 2005-10-20 US claimed
EP-1578870-A2 SENSITIZER DYES FOR PHOTOACID GENERATING SYSTEMS Aprilis, Inc. (US) 2005-09-28 EP claimed
WO-2004059389-A2 SENSITIZER DYES FOR PHOTOACID GENERATING SYSTEMS APRILIS, INC. (US) 2004-07-15 WO claimed