Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 11/20 | 0.43 |
| ▸ | INPP5A | Q14642 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.39 |
| ▸ | PKM | P14618 | 2/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14344176 | 0.80 | KDM4E (0.47) | KDM4EALDH1A1TDP1PKMEPHX2 | |
| SCHEMBL3772719 | 0.77 | KDM4E (0.39) | KDM4EALDH1A1TDP1PKMEPHX2 | |
| SCHEMBL3645416 | 0.76 | KDM4E (0.40) | KDM4EALDH1A1TDP1PKMEPHX2 | |
| SCHEMBL3649759 | 0.76 | KDM4E (0.40) | KDM4EALDH1A1TDP1PKMEPHX2 | |
| SCHEMBL4545256 | 0.73 | KDM4E (0.41) | KDM4EALDH1A1TDP1PKMLMNA | |
| SCHEMBL3436089 | 0.73 | KDM4E (0.39) | KDM4EALDH1A1TDP1PKMEPHX2 | |
| Ethylene SCHEMBL9419360 | 0.72 | KDM4E (0.52) | KDM4EALDH1A1TDP1EPHX2LMNA | |
| SCHEMBL154141 | 0.72 | — | — | |
| SCHEMBL9473130 | 0.72 | — | — | |
| SCHEMBL33077 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100183980-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |
| US-20100183980-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-07-22 | — | — | US | disclosed |