SCHEMBL132912

SCHEMBL132912

CCC(C)(C)C(=O)OC1CCCC1C

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.39
TSHR P16473 4/20 0.35
ALDH1A1 P00352 3/20 0.35
LMNA P02545 1/20 0.35
MAPK1 P28482 1/20 0.35
HTT P42858 1/20 0.35
RAB9A P51151 1/20 0.35
SMN1; SMN2 Q16637 2/20 0.33
HPGD P15428 1/20 0.33
HSD17B10 Q99714 1/20 0.33
HMGCR P04035 4/20 0.33
FKBP1A P62942 2/20 0.33
CYP3A4 P08684 3/20 0.32
USP2 O75604 2/20 0.32
SLCO1B1 Q9Y6L6 2/20 0.32
KDM4E B2RXH2 1/20 0.32
NR1I2 O75469 1/20 0.32
ABCB11 O95342 1/20 0.32
NR3C1 P04150 1/20 0.32
PGR P06401 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3434651 0.97 CYP19A1 (0.42) CYP19A1TSHRALDH1A1SMN1; SMN2HMGCR
SCHEMBL11920450 0.95 CYP19A1 (0.41) CYP19A1TSHRALDH1A1SMN1; SMN2HMGCR
SCHEMBL15889403 0.86 CYP19A1 (0.41) CYP19A1TSHRALDH1A1LMNAMAPK1
SCHEMBL12109916 0.84 HMGCR (0.33) ALDH1A1HPGDHMGCRFKBP1A
SCHEMBL15681467 0.83 CYP19A1 (0.44) CYP19A1ALDH1A1HPGDHMGCRFKBP1A
SCHEMBL9945786 0.81 HMGCR (0.37) ALDH1A1HMGCRFKBP1AMEN1KMT2A
SCHEMBL18253358 0.80 ALDH1A1 (0.35) CYP19A1TSHRALDH1A1SMN1; SMN2HMGCR
SCHEMBL19050812 0.80 CYP19A1 (0.32) CYP19A1TSHRALDH1A1SMN1; SMN2HMGCR
SCHEMBL12993041 0.79 NPY1R (0.37) TSHRALDH1A1SMN1; SMN2HMGCRFKBP1A
SCHEMBL18253360 0.79 ALDH1A1 (0.35) TSHRALDH1A1SMN1; SMN2HMGCRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20160209745-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2016-07-21 US disclosed
US-9250519-B2 Pattern forming method and actinic ray-sensitive or radiation-sensitive resin composition for use in the method FUJIFILM CORPORATION (JP) 2016-02-02 US disclosed
US-9052594-B2 Positive photosensitive composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2015-06-09 US disclosed
US-20150118621-A1 METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed
US-20150111135-A1 PATTERN FORMING METHOD AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR USE IN THE METHOD FUJIFILM CORPORATION (JP) 2015-04-23 US disclosed
US-20120058431-A1 POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME FUJIFILM CORPORATION (JP) 2012-03-08 US disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-20070172761-A1 Positive photosensitive composition and method of forming pattern using the same FUJIFILM CORPORATION (JP) 2007-07-26 US disclosed