Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 3/20 | 0.37 |
| ▸ | FKBP1A | P62942 | 5/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.31 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17088137 | 0.97 | HMGCR (0.40) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL14997741 | 0.95 | HMGCR (0.39) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL15889341 | 0.86 | HMGCR (0.39) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL15681469 | 0.83 | HMGCR (0.41) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL26753658 | 0.82 | HMGCR (0.33) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL16789537 | 0.81 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL132912 | 0.81 | CYP19A1 (0.39) | HMGCRFKBP1AALDH1A1MEN1KMT2A | |
| SCHEMBL11953035 | 0.81 | HMGCR (0.33) | HMGCR | |
| SCHEMBL14362098 | 0.81 | HMGCR (0.34) | HMGCR | |
| SCHEMBL10187705 | 0.81 | HMGCR (0.40) | HMGCRFKBP1AALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10031419-B2 | Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device | FUJIFILM CORPORATION (JP) | 2018-07-24 | — | — | US | disclosed |
| US-9810981-B2 | Pattern formation method, etching method, electronic device manufacturing method, and electronic device | FUJIFILM CORPORATION (JP) | 2017-11-07 | — | — | US | disclosed |
| US-20160342083-A1 | PATTERN FORMATION METHOD, ETCHING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-9323150-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-04-26 | — | — | US | disclosed |
| US-20160048075-A1 | PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2016-02-18 | — | — | US | disclosed |
| US-20160033862-A1 | ACTIVE LIGHT-SENSITIVE, OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN-FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2016-02-04 | — | — | US | disclosed |
| US-20150277225-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-01 | — | — | US | disclosed |
| US-8999621-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2015-04-07 | — | — | US | disclosed |
| US-20140227636-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-14 | — | — | US | disclosed |
| US-20140030643-A1 | ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2014-01-30 | — | — | US | disclosed |
| US-20130236837-A1 | METHOD FOR FORMING A RESIST PATTERN AND A METHOD FOR PROCESSING A SUBSTRATE UTILIZING THE METHOD FOR FORMING A RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2013-09-12 | — | — | US | disclosed |
| US-20130130178-A1 | ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8252877-B2 | Polymerizable compound and polymer compound obtained by using the same | FUJIFILM CORPORATION (JP) | 2012-08-28 | — | — | US | disclosed |
| US-20120148957-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20100159392-A1 | PATTERNING PROCESS AND RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| US-20100152401-A1 | POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-06-17 | — | — | US | disclosed |
| US-7666574-B2 | Positive resist composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2010-02-23 | — | — | US | disclosed |
| US-20080241746-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100152401-A1 | POLYMERIZABLE COMPOUND AND POLYMER COMPOUND OBTAINED BY USING THE SAME | CA11, CNOT1, CA1 | HMGCR 4664/4885FKBP1A 442/4885ALDH1A1 902/4885 |
| US-20150277225-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM FORMED USING SAID COMPOSITION, METHOD FOR FORMING PATTERN USING SAID COMPOSITION, PROCESS FOR PRODUCING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | TERB1, ACTR5, ADPRS | HMGCR 1271/4885FKBP1A 4737/4885ALDH1A1 2080/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.