Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.36 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
| ▸ | HMGCR | P04035 | 1/20 | 0.31 |
| ▸ | RIPK1 | Q13546 | 5/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL130762 | 0.82 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL21284569 | 0.82 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL6368436 | 0.80 | CYP4F2 (0.37) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL13301441 | 0.80 | CYP4F2 (0.37) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL13296226 | 0.79 | CYP4F2 (0.39) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL2735475 | 0.78 | CYP4F2 (0.36) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL14865696 | 0.78 | CYP4F2 (0.36) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL14770505 | 0.78 | CYP4F2 (0.36) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL25667341 | 0.78 | CYP4F2 (0.36) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL106916 | 0.78 | HTT (0.45) | CYP4F2CYP4A11LMNAHSD17B10HMGCR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7736822-B2 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20100081081-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7309560-B2 | Composition for forming anti-reflective coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-12-18 | — | — | US | disclosed |
| US-20070190459-A1 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |