Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 2/20 | 0.38 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | HMGCR | P04035 | 2/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21284569 | 0.86 | CYP4F2 (0.38) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL6368436 | 0.84 | CYP4F2 (0.37) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL13301441 | 0.84 | CYP4F2 (0.37) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL13563651 | 0.83 | CYP4F2 (0.34) | CYP4F2CYP4A11HMGCR | |
| SCHEMBL14770505 | 0.82 | CYP4F2 (0.36) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL13296166 | 0.82 | CYP4F2 (0.36) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL16940039 | 0.82 | CYP4F2 (0.44) | CYP4F2CYP4A11LMNAHSD17B10CYP2C19 | |
| SCHEMBL14865696 | 0.82 | CYP4F2 (0.36) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL25667341 | 0.82 | CYP4F2 (0.36) | CYP4F2CYP4A11LMNAHSD17B10HMGCR | |
| SCHEMBL2735475 | 0.82 | CYP4F2 (0.36) | CYP4F2CYP4A11LMNAHSD17B10HMGCR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240229026-A1 | CHIRAL CONTROL | WAVE LIFE SCIENCES LTD. (SG) | 2024-07-11 | — | — | US | disclosed |
| US-11829069-B2 | Photoresist compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-28 | — | — | US | disclosed |
| US-20230295617-A1 | METHODS AND COMPOSITIONS OF BIOLOGICALLY ACTIVE AGENTS | WAVE LIFE SCIENCES LTD. (SG) | 2023-09-21 | — | — | US | disclosed |
| US-11643657-B2 | Chiral control | WAVE LIFE SCIENCES LTD. (SG) | 2023-05-09 | — | — | US | disclosed |
| US-20180216107-A1 | OLIGONUCLEOTIDE COMPOSITIONS AND METHODS THEREOF | WAVE LIFE SCIENCES LTD. (SG) | 2018-08-02 | — | — | US | disclosed |
| US-20180216108-A1 | OLIGONUCLEOTIDE COMPOSITIONS AND METHODS THEREOF | WAVE LIFE SCIENCES LTD. (SG) | 2018-08-02 | — | — | US | disclosed |
| US-20180210339-A1 | RESIST COMPOSITION, AND RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE, EACH USING RESIST COMPOSITION | FUJIFILM CORPORATION (JP) | 2018-07-26 | — | — | US | disclosed |
| US-20180180996-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| US-20180181003-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2018-06-28 | — | — | US | disclosed |
| US-9982257-B2 | Chiral control | WAVE LIFE SCIENCES LTD. (SG) | 2018-05-29 | — | — | US | disclosed |
| US-20120249995-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-8148053-B2 | DNA sequenceing, biochemical immobilization, and genetic diagnosis; forming monomolecular film using (alkoxyalkoxy)alkylsilane(triol and/or halide) such as 10-(methoxymethoxy)dodecyltrimethoxysilane which forms hydroxyl groups when exposed to acid; forming polysulfonates; radiation with high energy beams | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-04-03 | — | — | US | disclosed |
| US-20120058431-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-03-08 | — | — | US | disclosed |
| US-8088537-B2 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-03 | — | — | US | disclosed |
| US-7642034-B2 | Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-01-05 | — | — | US | disclosed |
| US-20090197200-A1 | Resist top coat composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20070178407-A1 | Polymer, resist protective coating material, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2007-08-02 | — | — | US | disclosed |
| US-20070172761-A1 | Positive photosensitive composition and method of forming pattern using the same | FUJIFILM CORPORATION (JP) | 2007-07-26 | — | — | US | disclosed |
| US-20070122736-A1 | RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. | 2007-05-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240229026-A1 | CHIRAL CONTROL | RNGTT, POLI, NSUN3 | CYP4F2 4155/4885CYP4A11 3570/4885LMNA 1868/4885 |
| US-20230295617-A1 | METHODS AND COMPOSITIONS OF BIOLOGICALLY ACTIVE AGENTS | ELOVL6, ELOVL5, ELOVL1 | CYP4F2 4796/4885CYP4A11 4108/4885LMNA 106/4885 |
| US-11643657-B2 | Chiral control | RNGTT, POLI, NSUN3 | CYP4F2 4155/4885CYP4A11 3570/4885LMNA 1868/4885 |
| US-20180216108-A1 | OLIGONUCLEOTIDE COMPOSITIONS AND METHODS THEREOF | RNGTT, NSUN2, POLRMT | CYP4F2 4703/4885CYP4A11 4487/4885LMNA 448/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.