Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.51 |
| ▸ | TP53 | P04637 | 1/20 | 0.51 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | MTOR | P42345 | 1/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.48 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.47 |
| ▸ | MME | P08473 | 1/20 | 0.46 |
| ▸ | ERAP2 | Q6P179 | 1/20 | 0.45 |
| ▸ | ERAP1 | Q9NZ08 | 1/20 | 0.45 |
| ▸ | LNPEP | Q9UIQ6 | 1/20 | 0.45 |
| ▸ | PTGES | O14684 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15623780 | 0.89 | MME (0.51) | MAPTPOLBLMNAHPGDMME | |
| SCHEMBL31444810 | 0.85 | MAPT (0.53) | MAPTTP53POLBLMNAHPGD | |
| SCHEMBL26205760 | 0.82 | MAPT (0.49) | MAPTTP53POLBLMNAHPGD | |
| SCHEMBL15623819 | 0.82 | TSHR (0.47) | MAPTLMNAMMEALDH1A1CYP3A4 | |
| SCHEMBL12302906 | 0.81 | ERAP2 (0.63) | MMEERAP2ERAP1LNPEPPTGES | |
| SCHEMBL7609436 | 0.81 | LMNA (0.52) | MAPTTP53POLBLMNAHPGD | |
| SCHEMBL10031574 | 0.81 | MME (0.65) | MAPTPOLBLMNAMMEALDH1A1 | |
| SCHEMBL1516159 | 0.81 | MME (0.65) | MAPTPOLBLMNAMMEALDH1A1 | |
| SCHEMBL10283303 | 0.81 | MME (0.65) | MAPTPOLBLMNAMMEALDH1A1 | |
| SCHEMBL13039581 | 0.80 | BCHE (0.50) | LMNAMMEALDH1A1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7736822-B2 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20100081081-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7309560-B2 | Composition for forming anti-reflective coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-12-18 | — | — | US | disclosed |
| US-20070190459-A1 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |