Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | AR | P10275 | 2/20 | 0.31 |
| ▸ | VDR | P11473 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | HMGCR | P04035 | 2/20 | 0.30 |
| ▸ | ADRB2 | P07550 | 1/20 | 0.30 |
| ▸ | ADRB1 | P08588 | 1/20 | 0.30 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14346380 | 0.80 | ADRB2 (0.38) | ADRB2ADRB1ADRB3 | |
| SCHEMBL12135548 | 0.78 | HMGCR (0.40) | LMNAKDM4EHMGCRADRB2ADRB1 | |
| SCHEMBL13296189 | 0.76 | ADRB2 (0.37) | CYP1A2ADRB2ADRB1ADRB3 | |
| SCHEMBL8656427 | 0.76 | TSHR (0.42) | LMNACYP1A2KDM4ESMN1; SMN2MAPT | |
| SCHEMBL21701054 | 0.75 | TTR (0.34) | POLB | |
| SCHEMBL13296228 | 0.75 | ADRB2 (0.48) | MAPTADRB2ADRB1ADRB3 | |
| SCHEMBL12889011 | 0.74 | CYP2D6 (0.51) | LMNACYP1A2MAPTPOLBNPSR1 | |
| SCHEMBL10636603 | 0.74 | TSHR (0.40) | LMNACYP1A2KDM4ESMN1; SMN2MAPT | |
| SCHEMBL12691395 | 0.74 | HMGCR (0.36) | LMNAKDM4EHMGCRADRB2ADRB1 | |
| SCHEMBL13296218 | 0.73 | ADRB2 (0.48) | ADRB2ADRB1ADRB3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7736822-B2 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2010-06-15 | — | — | US | disclosed |
| US-20100081081-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-04-01 | — | — | US | disclosed |
| US-7309560-B2 | Composition for forming anti-reflective coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2007-12-18 | — | — | US | disclosed |
| US-20070190459-A1 | Resist underlayer coating forming composition for mask blank, mask blank and mask | HOYA CORPORATION (JP) | 2007-08-16 | — | — | US | disclosed |