SCHEMBL13296199

SCHEMBL13296199

CC1C(=O)N(c2ccc(I)cc2)C(=O)C1C

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 3/20 0.54
FAAH O00519 2/20 0.54
RAB9A P51151 1/20 0.46
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
CACNA1B Q00975 3/20 0.38
APBA1 Q02410 3/20 0.38
F2 P00734 1/20 0.37
ELANE P08246 1/20 0.37
CTSG P08311 1/20 0.37
CMA1 P23946 1/20 0.37
CTRC Q99895 1/20 0.37
MAOA P21397 1/20 0.36
TP53 P04637 1/20 0.36
CYP3A4 P08684 1/20 0.35
TSHR P16473 1/20 0.35
CYP2C19 P33261 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13753295 0.89 RAB9A (0.53) MGLLFAAHRAB9AKMT2AMEN1
SCHEMBL13198797 0.80 RAB9A (0.66) MGLLRAB9AKMT2AMEN1CACNA1B
SCHEMBL9923585 0.78 MAPK1 (0.54) MGLLRAB9AKMT2AMEN1TP53
SCHEMBL13296173 0.78 FAAH (0.54) MGLLFAAHRAB9AKMT2AMEN1
SCHEMBL11753838 0.78 NPSR1 (0.36) MGLLFAAHRAB9AKMT2AMEN1
SCHEMBL10031597 0.77 MEN1 (0.57) MGLLRAB9AKMT2AMEN1CACNA1B
SCHEMBL9923584 0.77 MEN1 (0.57) MGLLRAB9AKMT2AMEN1CACNA1B
SCHEMBL11948496 0.74 CA12 (0.62) KMT2AMEN1TP53TSHR
SCHEMBL2740708 0.72 CA1 (0.42) RAB9AKMT2AMEN1TSHRCYP2C19
SCHEMBL9923580 0.72 CA1 (0.63)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013047859-A1 COLORING COMPOSITION, COLORED PATTERN, COLOR FILTER AND METHOD OF PRODUCING THE SAME, PATTERN FORMING METHOD, SOLID-STATE IMAGING DEVICE, AND IMAGE DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 WO disclosed
US-7736822-B2 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2010-06-15 US disclosed
US-20100081081-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION FOR ELECTRON BEAM LITHOGRAPHY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2010-04-01 US disclosed
US-7309560-B2 Composition for forming anti-reflective coating NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2007-12-18 US disclosed
US-20070190459-A1 Resist underlayer coating forming composition for mask blank, mask blank and mask HOYA CORPORATION (JP) 2007-08-16 US disclosed