SCHEMBL133173

SCHEMBL133173

CCCOc1ccc(Cl)c2c1[S+]([O-])c1ccccc1C2

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CSNK2A1 P68400 2/20 0.35
RAB9A P51151 2/20 0.33
NPC1 O15118 1/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
MAPT P10636 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
PKM P14618 1/20 0.33
PDE7A Q13946 1/20 0.32
PDE7B Q9NP56 1/20 0.32
KDM4E B2RXH2 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
ATM Q13315 1/20 0.30
GPR84 Q9NQS5 1/20 0.30
ADRA2A P08913 1/20 0.30
ADRA2B P18089 1/20 0.30
ADRA2C P18825 1/20 0.30
ADRA1D P25100 1/20 0.30
ADRA1A P35348 1/20 0.30
ADRA1B P35368 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1615176 0.92 S1PR5 (0.36) RAB9ANPC1MEN1KMT2AMAPT
SCHEMBL3159501 0.92 S1PR5 (0.36) RAB9ANPC1MEN1KMT2AMAPT
SCHEMBL84111 0.90 MEN1 (0.30) MEN1KMT2A
SCHEMBL7769310 0.87 PTPRC (0.30)
SCHEMBL8065205 0.87 HTT (0.34)
SCHEMBL1614173 0.85 L3MBTL1 (0.31) MEN1KMT2AMAPTL3MBTL1PKM
SCHEMBL1615142 0.85 MEN1 (0.31) MEN1KMT2AMAPTL3MBTL1
SCHEMBL8626631 0.83 MEN1 (0.32) MEN1KMT2A
SCHEMBL1615143 0.83 NPC1 (0.38) RAB9ANPC1MAPTL3MBTL1SMN1; SMN2
SCHEMBL1614823 0.82 MAPT (0.31) CSNK2A1MAPTL3MBTL1PKMSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 5309 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120044753-B Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board Hangzhou foster Electronic Materials Co.,Ltd. (CN) 2026-05-26 CN claimed
EP-3685231-B1 3D PRINTING WITH POLYMERIC NANOGEL PARTICLES THE REGENTS OF THE UNIV OF COLORADO A BODY CORPORATE A COLORADO NON PROFIT (US) 2026-05-13 EP claimed
EP-3662023-B1 A PHOTOINITIATING COMPOSITION SUITABLE FOR UV-LED LIGHT IRRADIATION AND AN AQUEOUS COATING COMPOSITION PREPARED THEREFROM GUANGDONG HUARUN PAINTS CO LTD (CN) 2025-10-22 EP claimed
EP-4606789-A1 POLYMERIZABLE BENZOPHENONE PHOTOINITIATORS ARKEMA FRANCE (FR) 2025-08-27 EP claimed
US-20250178267-A1 METHOD FOR PRODUCING SELECTIVELY METALLISED THREE-DIMENSIONAL ITEMS WITH A MASKING COATING COMPOSITION JET METAL TECHNOLOGIES (FR) 2025-06-05 US claimed
US-20250171566-A1 LIQUID, HYBRID UV/VIS RADIATION CURABLE RESIN COMPOSITIONS FOR ADDITIVE FABRICATION STRATASYS INC (US) 2025-05-29 US claimed
CN-120044753-A Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board 杭州福斯特电子材料有限公司 2025-05-27 CN claimed
CN-120029006-A Photosensitive resin composition, photosensitive dry film, cured film, circuit board and display module 杭州福斯特电子材料有限公司 2025-05-23 CN claimed
CN-120018945-A Three-dimensional printing method for fiber composite material MOI复合材料有限责任公司 2025-05-16 CN claimed
CN-119677597-A Method for producing an optical effect layer comprising magnetic or magnetizable pigment particles and exhibiting more than one marking 锡克拜控股有限公司 2025-03-21 CN claimed
CN-1437586-A Triazine-based compound comprising functionalized alkylthio groups, and photo polymerization initiator LG CHEMICAL LTD (KR) 2003-08-20 CN claimed
EP-1289967-A1 TRIAZINE-BASED COMPOUND COMPRISING FUNCTIONALIZED ALKYLTHIO GROUPS, AND PHOTOPOLYMERIZATION INITIATOR LG Chemical Co. Ltd (KR) 2003-03-12 EP claimed
US-20020176793-A1 Metallic filled pastes 3D SYSTEMS, INC. 2002-11-28 US claimed
WO-2001096317-A1 TRIAZINE-BASED COMPOUND COMPRISING FUNCTIONALIZED ALKYLTHIO GROUPS, AND PHOTOPOLYMERIZATION INITIATOR LG CHEMICAL CO., LTD (KR) 2001-12-20 WO claimed
EP-1117368-A1 DENTAL COMPOSITION BASED ON SILICONE CROSSLINKABLE BY CATION PROCESS RHODIA CHIMIE (FR) 2001-07-25 EP claimed
EP-0520574-B1 Thioxanthone derivatives LAMBSON FINE CHEMICALS LIMITED (GB) 2000-08-16 EP claimed
WO-2000019967-A1 DENTAL COMPOSITION BASED ON SILICONE CROSSLINKABLE BY CATION PROCESS RHODIA CHIMIE (FR) 2000-04-13 WO claimed
EP-0962826-A1 A positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-12-08 EP claimed
US-5500040-A Ultraviolet-curable thermochromic ink composition SAKURA COLOR PRODUCTS CORPORATION (JP) 1996-03-19 US claimed
US-5414092-A Photoinitiators INTERNATIONAL BIO-SYNTHETICS LIMITED (GB) 1995-05-09 US claimed