Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NISCH | Q9Y2I1 | 10/20 | 0.81 |
| ▸ | GAA | P10253 | 1/20 | 0.80 |
| ▸ | TSHR | P16473 | 1/20 | 0.80 |
| ▸ | TOP2A | P11388 | 5/20 | 0.75 |
| ▸ | TOP2B | Q02880 | 5/20 | 0.75 |
| ▸ | LMNA | P02545 | 1/20 | 0.59 |
| ▸ | RECQL | P46063 | 1/20 | 0.59 |
| ▸ | HTR1D | P28221 | 1/20 | 0.55 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2513540 | 0.90 | NISCH (0.68) | NISCHGAATSHRTOP2ATOP2B | |
| SCHEMBL31249900 | 0.90 | NISCH (0.68) | NISCHGAATSHRTOP2ATOP2B | |
| SCHEMBL4035055 | 0.90 | NISCH (0.68) | NISCHGAATSHRTOP2ATOP2B | |
| SCHEMBL11462790 | 0.90 | NISCH (1.00) | NISCHGAATSHRTOP2ATOP2B | |
| SCHEMBL4035056 | 0.90 | NISCH (0.68) | NISCHGAATSHRTOP2ATOP2B | |
| SCHEMBL6365864 | 0.89 | NISCH (1.00) | NISCHGAATSHRTOP2ATOP2B | |
| Hydrochloric Acid SCHEMBL9828172 | 0.88 | NISCH (0.66) | NISCHGAATSHRTOP2ATOP2B | |
| SCHEMBL533671 | 0.87 | NISCH (0.69) | NISCHGAATSHRTOP2ATOP2B | |
| SCHEMBL7724230 | 0.87 | TOP2A (1.00) | NISCHGAATSHRTOP2ATOP2B | |
| SCHEMBL5476725 | 0.85 | NISCH (0.79) | NISCHTOP2ATOP2BLMNARECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7718343-B2 | Decomposable resin composition and pattern-forming material including the same | FUJIFILM CORPORATION (JP) | 2010-05-18 | — | — | US | disclosed |
| US-7439011-B2 | Photothermographic material | FUJIFILM CORPORATION (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7419774-B2 | Photothermographic material and method for processing the same | FUJILFILM CORPORATION (JP) | 2008-09-02 | — | — | US | disclosed |
| US-20080070154-A1 | DECOMPOSABLE RESIN COMPOSITION AND PATTERN-FORMING MATERIAL INCLUDING THE SAME | FUJIFILM CORPORATION (JP) | 2008-03-20 | — | — | US | disclosed |
| US-7223528-B2 | Photothermographic material and image forming method | FUJIFILM CORPORATION (JP) | 2007-05-29 | — | — | US | disclosed |
| US-20070003887-A1 | Photothermographic material | RIKIO INOUE | 2007-01-04 | — | — | US | disclosed |
| US-20070003887-A1 | Photothermographic material | RIKIO INOUE | 2007-01-04 | — | — | US | disclosed |