SCHEMBL6365864

SCHEMBL6365864

c1ccc(C2=NCCCN2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
▸ NISCH Q9Y2I1 10/20 1.00
▸ GAA P10253 1/20 1.00
▸ TSHR P16473 1/20 1.00
▸ TOP2A P11388 4/20 0.62
▸ TOP2B Q02880 4/20 0.62
▸ ALDH1A1 P00352 1/20 0.59
▸ CYP1A2 P05177 1/20 0.59
▸ HPGD P15428 1/20 0.59
▸ CASP1 P29466 1/20 0.59
▸ CASP7 P55210 1/20 0.59
▸ HSD17B10 Q99714 1/20 0.59
▸ MAOB P27338 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7578157 0.89 NISCH (0.80) NISCHGAATSHRTOP2ATOP2B
SCHEMBL13327264 0.89 NISCH (0.81) NISCHGAATSHRTOP2ATOP2B
SCHEMBL105024 0.87 NISCH (1.00) NISCHGAATSHRTOP2ATOP2B
SCHEMBL14029044 0.86 NISCH (0.75) NISCHGAATSHRTOP2ATOP2B
Ammonia Solution, Strong SCHEMBL7104964 0.85 NISCH (0.96) NISCHGAATSHRTOP2ATOP2B
SCHEMBL28772851 0.85 NISCH (0.96) NISCHGAATSHRTOP2ATOP2B
Bromide SCHEMBL29039569 0.85 NISCH (0.96) NISCHGAATSHRTOP2ATOP2B
SCHEMBL6746742 0.85 NISCH (0.80) NISCHGAATSHRTOP2ATOP2B
SCHEMBL8141372 0.83 NISCH (1.00) NISCHGAATSHRTOP2ATOP2B
SCHEMBL533671 0.82 NISCH (0.69) NISCHGAATSHRTOP2ATOP2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240309298-A1 STRIPPER COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-09-19 — — US claimed
US-20210102027-A1 Potting Compound and Insulating Material SIEMENS AKTIENGESELLSCHAFT (DE) 2021-04-08 — — US claimed
EP-3523348-A1 POTTING COMPOUND, INSULATING MATERIAL, AND USE THEREOF Siemens Aktiengesellschaft (DE) 2019-08-14 — — EP claimed
WO-2018099891-A1 POTTING COMPOUND, INSULATING MATERIAL, AND USE THEREOF SIEMENS AKTIENGESELLSCHAFT (DE) 2018-06-07 — — WO claimed
EP-0276503-B1 PROCESS FOR PREPARING A 2-ALKYL- OR 2-PHENYL-1,4,5,6-TETRAHYDROPYRIMIDINEAND AND PROCESS FOR THE PREPARATION OF 2-ALKYL- OR 2-PHENYL- PYRIMIDINES DSM N.V. (NL) 1992-07-22 — — EP claimed
US-12234399-B2 Chemical solution, method for manufacturing chemical solution, and method for treating substrate FUJIFILM CORPORATION (JP) 2025-02-25 — — US disclosed
US-20240309298-A1 STRIPPER COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-09-19 — — US disclosed
CN-117198858-A Chemical solution, method for producing chemical solution, and method for treating substrate 富士胶片株式会社 2023-12-08 — — CN disclosed
US-20230340326-A1 CHEMICAL SOLUTION, METHOD FOR MANUFACTURING CHEMICAL SOLUTION, AND METHOD FOR TREATING SUBSTRATE FUJIFILM CORPORATION (JP) 2023-10-26 — — US disclosed
CN-111684575-B Chemical solution, method for producing chemical solution, and method for treating substrate 富士胶片株式会社 2023-09-29 — — CN disclosed
US-11732190-B2 Chemical solution, method for manufacturing chemical solution, and method for treating substrate FUJIFILM CORPORATION (JP) 2023-08-22 — — US disclosed
US-20210102027-A1 Potting Compound and Insulating Material SIEMENS AKTIENGESELLSCHAFT (DE) 2021-04-08 — — US disclosed
EP-0276503-B1 PROCESS FOR PREPARING A 2-ALKYL- OR 2-PHENYL-1,4,5,6-TETRAHYDROPYRIMIDINEAND AND PROCESS FOR THE PREPARATION OF 2-ALKYL- OR 2-PHENYL- PYRIMIDINES DSM N.V. (NL) 1992-07-22 — — EP disclosed
EP-0276503-B1 PROCESS FOR PREPARING A 2-ALKYL- OR 2-PHENYL-1,4,5,6-TETRAHYDROPYRIMIDINEAND AND PROCESS FOR THE PREPARATION OF 2-ALKYL- OR 2-PHENYL- PYRIMIDINES DSM N.V. (NL) 1992-07-22 — — EP disclosed
US-4880929-A OXIDATION, DEHYDRATION; OXIDATION CATALYSTS, METAL OXIDES, DIAMINOPROPANE WITH ACID STAMICARBON B.V. (NL) 1989-11-14 — — US disclosed
EP-0226511-B1 5-PHENYL-1,4,5,6-TETRAHYDROPYRIMIDINE DERIVATIVES, PREPARATION PROCESS AND MEDICINAL USE LABORATOIRE L. LAFON Société anonyme dite: (FR) 1989-08-02 — — EP disclosed
US-4774248-A Methods of treating depression and depressive states using 5-phenyl-1,4,5,6-tetrahydropyrimidine derivatives SOCIETE ANONYME DITE: LABORATOIRE L. LAFON (FR) 1988-09-27 — — US disclosed
EP-0276503-A1 Process for preparing a 2-alkyl- or 2-phenyl-1,4,5,6-tetrahydropyrimidineand and process for the preparation of 2-alkyl- or 2-phenyl- pyrimidines DSM N.V. (NL) 1988-08-03 — — EP disclosed
EP-0276503-A1 Process for preparing a 2-alkyl- or 2-phenyl-1,4,5,6-tetrahydropyrimidineand and process for the preparation of 2-alkyl- or 2-phenyl- pyrimidines DSM N.V. (NL) 1988-08-03 — — EP disclosed
EP-0226511-A1 5-Phenyl-1,4,5,6-tetrahydropyrimidine derivatives, preparation process and medicinal use LABORATOIRE L. LAFON Société anonyme dite: (FR) 1987-06-24 — — EP disclosed
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