Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20176706 | 0.86 | POLB (0.44) | POLBKMT2A | |
| SCHEMBL14564324 | 0.80 | ALDH1A1 (0.46) | KMT2A | |
| SCHEMBL14448181 | 0.80 | ALDH1A1 (0.46) | KMT2A | |
| SCHEMBL107102 | 0.80 | ALDH1A1 (0.46) | KMT2A | |
| SCHEMBL14491491 | 0.80 | ALDH1A1 (0.46) | KMT2A | |
| SCHEMBL4834444 | 0.80 | ALDH1A1 (0.36) | POLBKMT2A | |
| SCHEMBL13327361 | 0.77 | — | — | |
| SCHEMBL4831836 | 0.74 | — | — | |
| SCHEMBL14492328 | 0.74 | — | — | |
| SCHEMBL14492326 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7714316-B2 | Method of manufacturing semiconductor device, acid etching resistance material and copolymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2010-05-11 | — | — | US | disclosed |
| US-7445881-B2 | Method of manufacturing semiconductor device, acid etching resistant material and copolymer | KABUSHIKI KAISHA TOSHIBA (JP) | 2008-11-04 | — | — | US | disclosed |
| US-20080261149-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER | ASAKAWA KOJI | 2008-10-23 | — | — | US | disclosed |
| US-20070138139-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, ACID ETCHING RESISTANCE MATERIAL AND COPOLYMER | ASAKAWA KOJI | 2007-06-21 | — | — | US | disclosed |