SCHEMBL107102

SCHEMBL107102

O=C1C2C3C=CC(C3)C2C(=O)N1OS(=O)(=O)C(F)(F)F

nearest known ligand 0.46

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.46
TDP1 Q9NUW8 1/20 0.46
SMN1; SMN2 Q16637 3/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
RAB9A P51151 2/20 0.41
TSHR P16473 2/20 0.41
MAPK1 P28482 2/20 0.41
HTT P42858 2/20 0.40
LMNA P02545 1/20 0.40
RECQL P46063 1/20 0.40
USP2 O75604 2/20 0.38
HSD17B10 Q99714 1/20 0.38
KDM4E B2RXH2 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14491491 1.00 ALDH1A1 (0.46) ALDH1A1TDP1SMN1; SMN2L3MBTL1MEN1
SCHEMBL14448181 1.00 ALDH1A1 (0.46) ALDH1A1TDP1SMN1; SMN2L3MBTL1MEN1
SCHEMBL14564324 1.00 ALDH1A1 (0.46) ALDH1A1TDP1SMN1; SMN2L3MBTL1MEN1
SCHEMBL20176706 0.90 POLB (0.44) ALDH1A1TDP1SMN1; SMN2L3MBTL1KMT2A
SCHEMBL14983976 0.85 ALDH1A1 (0.42) ALDH1A1TDP1SMN1; SMN2L3MBTL1MEN1
SCHEMBL52182 0.85 ALDH1A1 (0.39) ALDH1A1TDP1SMN1; SMN2L3MBTL1MEN1
SCHEMBL14983970 0.85 ALDH1A1 (0.40) ALDH1A1TDP1SMN1; SMN2L3MBTL1MEN1
SCHEMBL548177 0.84 ALDH1A1 (0.38) ALDH1A1TDP1SMN1; SMN2L3MBTL1MEN1
SCHEMBL4831836 0.84
SCHEMBL13495424 0.83 HTT (0.43) ALDH1A1TDP1SMN1; SMN2L3MBTL1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1945 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115368494-A Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application 瑞红(苏州)电子化学品股份有限公司 2022-11-22 CN claimed
CN-114779577-A Cyclodextrin inclusion compound molecular glass photoresist 南通林格橡塑制品有限公司 2022-07-22 CN claimed
CN-114442429-A Molecular glass photoresist of metallocene compound and preparation method thereof 南通林格橡塑制品有限公司 2022-05-06 CN claimed
EP-2297613-B1 ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES UNIV CORNELL (US) 2017-11-29 EP claimed
US-8846301-B2 Orthogonal processing of organic materials used in electronic and electrical devices CORNELL UNIVERSITY (US) 2014-09-30 US claimed
US-8029971-B2 Photopatternable dielectric materials for BEOL applications and methods for use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-10-04 US claimed
US-20110159252-A1 Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices NATIONAL SCIENCE FOUNDATION 2011-06-30 US claimed
US-7919225-B2 Photopatternable dielectric materials for BEOL applications and methods for use INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-04-05 US claimed
EP-2297613-A2 ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES Cornell University (US) 2011-03-23 EP claimed
US-7867689-B2 Method of use for photopatternable dielectric materials for BEOL applications INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2011-01-11 US claimed
WO-2009143357-A2 ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES CORNELL UNIVERSITY (US) 2009-11-26 WO claimed
US-20090291389-A1 PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-11-26 US claimed
US-20090233226-A1 PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-09-17 US claimed
US-20080286467-A1 METHOD OF USE FOR PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS GLOBALFOUNDRIES U.S. INC. 2008-11-20 US claimed
US-6114082-A Frequency doubling hybrid photoresist having negative and positive tone components and method of preparing the same INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2000-09-05 US claimed
US-12624392-B2 Molecular array generation using photoresist 10X GENOMICS, INC. (US) 2026-05-12 US disclosed
US-12570872-B2 Acrylic polymerized polysiloxane, composition comprising the same, and cured film produced using the same MERCK PATENT GMBH (DE) 2026-03-10 US disclosed
US-5164278-A Aromatic hydroxy compound INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1992-11-17 US disclosed
EP-0445058-A1 Speed enhancers for acid sensitized resists International Business Machines Corporation (US) 1991-09-04 EP disclosed
EP-0388343-A2 Chemically amplified photoresist International Business Machines Corporation (US) 1990-09-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12570872-B2 Acrylic polymerized polysiloxane, composition comprising the same, and cured film produced using the same SMC1A, SMC2, SMC3 ALDH1A1 283/4885TDP1 4036/4885SMN1; SMN2 2140/4885
US-20110159252-A1 Orthogonal Procesing of Organic Materials Used in Electronic and Electrical Devices FRG1, RARG, NPM1 ALDH1A1 2340/4885TDP1 2344/4885SMN1; SMN2 2795/4885
US-12624392-B2 Molecular array generation using photoresist POLL, LIG4, LIG3 ALDH1A1 189/4885TDP1 326/4885SMN1; SMN2 3258/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.