⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL252442 | 0.73 | — | — | |
| SCHEMBL4213064 | 0.73 | ALDH1A1 (0.35) | — | |
| SCHEMBL31602089 | 0.69 | — | — | |
| SCHEMBL28983835 | 0.69 | — | — | |
| SCHEMBL6340903 | 0.69 | — | — | |
| SCHEMBL31042221 | 0.69 | — | — | |
| SCHEMBL13571386 | 0.69 | — | — | |
| SCHEMBL28787912 | 0.69 | — | — | |
| SCHEMBL6338522 | 0.69 | — | — | |
| SCHEMBL6178896 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250308734-A1 | MULTILAYER VARISTOR AND METHOD OF PRODUCING SAME | PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) | 2025-10-02 | — | — | US | disclosed |
| CN-105001254-A | Manufacturing methods for film-forming material, group IV metal oxide film | TOSOH CORP | 2015-10-28 | — | — | CN | disclosed |
| CN-103917487-A | Film-forming material, group IV metal oxide film, and vinylidene diamide complex | TOSOH CORP | 2014-07-09 | — | — | CN | disclosed |
| US-20140178503-A1 | CYCLOHEXYL UREA MODULATORS OF D2 RECEPTORS AND/OR D3 RECEPTORS | AUSPEX PHARMACEUTICALS, INC. (US) | 2014-06-26 | — | — | US | disclosed |
| US-7714155-B2 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| US-20090035464-A1 | Alkoxide compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2009-02-05 | — | — | US | disclosed |