Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.61 |
| ▸ | TSHR | P16473 | 2/20 | 0.61 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.40 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.40 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.40 |
| ▸ | PGR | P06401 | 1/20 | 0.40 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.40 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.40 |
| ▸ | HTR1A | P08908 | 1/20 | 0.40 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.40 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.40 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.40 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.40 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.40 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.40 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid Propyl Ester SCHEMBL896475 | 0.96 | ALDH1A1 (0.57) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL17255103 | 0.94 | ALDH1A1 (0.55) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL262663 | 0.93 | ALDH1A1 (0.70) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL4327431 | 0.92 | ALDH1A1 (0.57) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL4320870 | 0.92 | ALDH1A1 (0.57) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL136783 | 0.92 | ALDH1A1 (0.57) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL1904639 | 0.92 | ALDH1A1 (0.63) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Ether SCHEMBL151166 | 0.91 | ALDH1A1 (0.74) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Ether SCHEMBL15348648 | 0.91 | ALDH1A1 (0.74) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL3273915 | 0.91 | ALDH1A1 (0.61) | ALDH1A1TSHRLMNAHSD17B10CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2622 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106697-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| WO-2025106703-A1 | BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING | HUSTAD PHILLIP DENE (US) | 2025-05-22 | — | — | WO | claimed |
| CN-118978832-A | Composition curable with content of dots, cured product of content of dots, method for producing optical member, and method for producing display device | DNP精细化工股份有限公司 | 2024-11-19 | — | — | CN | claimed |
| CN-118983127-A | Heterojunction conductive paste, carrier thereof, preparation and application of carrier resin composition | 长沙连古科技有限公司 | 2024-11-19 | — | — | CN | claimed |
| CN-118853047-A | Conductive adhesive containing low-halogen epoxy resin composition and preparation method thereof | 长沙连古科技有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-114206996-B | Method for preparing polymer microparticles, and medical composition, cosmetic composition, medical article and cosmetic article using the same | 株式会社LG化学 | 2024-01-02 | — | — | CN | claimed |
| CN-114269813-B | Method for preparing polymer microparticles, and medical composition, cosmetic composition, medical article and cosmetic article using the same | 株式会社LG化学 | 2024-01-02 | — | — | CN | claimed |
| US-11822250-B2 | Solution, method of forming resist pattern, and semiconductor device manufacturing method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | claimed |
| CN-109563363-B | Formulation and process for producing highly conductive copper patterns | 铜打印科技有限公司 | 2023-03-10 | — | — | CN | claimed |
| US-11561438-B2 | Liquid crystal alignment agent composition, and liquid crystal alignment film, and liquid crystal display using the same | LG CHEM, LTD. (KR) | 2023-01-24 | — | — | US | claimed |
| US-20040266912-A1 | Nonaqueous ink-jet ink | TOYO INK MFG. CO., LTD. (JP) | 2004-12-30 | — | — | US | claimed |
| US-6656763-B1 | Spin on polymers for organic memory devices | ADVANCED MICRO DEVICES, INC. | 2003-12-02 | — | — | US | claimed |
| EP-1336609-A2 | Recovery of 3,4-epoxy-1-butene by extractive distillation | EASTMAN CHEMICAL COMPANY (US) | 2003-08-20 | — | — | EP | claimed |
| US-6582565-B1 | Recovery of 3,4-epoxy-1-butene by extractive distillation | EASTMAN CHEMICAL COMPANY | 2003-06-24 | — | — | US | claimed |
| US-6379860-B1 | RESIN OBTAINED BY REACTION OF ALKALI-SOLUBLE RESIN HAVING PHENOLIC HYDROXYL GROUPS WITH ENOL ETHER DECOMPOSES IN ACID TO INCREASE SOLUBILITY; HEAT RESISTANCE, SENSITIVIY, RESOLUTION; GENERATES ACID UPON ACTINIC RADIATION EXPOSURE | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-30 | — | — | US | claimed |
| US-20020015906-A1 | Polymer for photoresist, method of production thereof and photoresist composition containing polymer | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-02-07 | — | — | US | claimed |
| US-5575859-A | APPLYING SOLVENT TO REMOVE INKS FROM SUBSTRATES, USING DELTA-BUTYROLACTONE OR N-METHYL-2-PYRROLIDONE AND PROPYLENE CARBONATE | CPS KEMI APS (DK) | 1996-11-19 | — | — | US | claimed |
| EP-0270654-B1 | A LIQUID FOR REMOVING PRINTING AND SCREEN PRINTING INKS | CPS KEMI ApS (DK) | 1991-05-02 | — | — | EP | claimed |
| EP-0270654-A1 | A LIQUID FOR REMOVING PRINTING AND SCREEN PRINTING INKS. | CPS KEMI APS (DK) | 1988-06-15 | — | — | EP | claimed |
| WO-1987007628-A1 | A LIQUID FOR REMOVING PRINTING AND SCREEN PRINTING INKS | CPS KEMI APS (DK) | 1987-12-17 | — | — | WO | claimed |