Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.70 |
| ▸ | TSHR | P16473 | 2/20 | 0.70 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.55 |
| ▸ | CHRM1 | P11229 | 3/20 | 0.44 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.44 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.44 |
| ▸ | PGR | P06401 | 1/20 | 0.44 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.44 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.44 |
| ▸ | HTR1A | P08908 | 1/20 | 0.44 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.44 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.44 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.44 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.44 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.44 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | CHRNA10 | Q9GZZ6 | 1/20 | 0.44 |
| ▸ | CHRNA9 | Q9UGM1 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid Propyl Ester SCHEMBL133511 | 0.93 | ALDH1A1 (0.61) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL19859126 | 0.93 | ALDH1A1 (0.82) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL896475 | 0.89 | ALDH1A1 (0.57) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL4320870 | 0.89 | ALDH1A1 (0.57) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL136783 | 0.89 | ALDH1A1 (0.57) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL4327431 | 0.89 | ALDH1A1 (0.57) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL23495512 | 0.89 | ALDH1A1 (0.70) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL14991 | 0.89 | — | — | |
| Tetraethylene Glycol SCHEMBL20210845 | 0.88 | ALDH1A1 (0.61) | ALDH1A1TSHRLMNAHSD17B10CHRM1 | |
| Acetic Acid Propyl Ester SCHEMBL17255103 | 0.88 | ALDH1A1 (0.55) | ALDH1A1TSHRLMNAHSD17B10CHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 210 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106398398-A | Metal nano conductive ink and preparation method thereof | 广东南海启明光大科技有限公司 | 2017-02-15 | — | — | CN | claimed |
| CN-1702560-B | Diluent composition for removing photosensitive resin | DONGJIN SIMIKEN CO LTD | 2011-08-03 | — | — | CN | claimed |
| CN-1702560-A | Diluent composition for removing light sensitive resin | DONGJIN SIMIKEN CO LTD (KR) | 2005-11-30 | — | — | CN | claimed |
| WO-2005038530-A1 | THINNER COMPOSITION FOR REMOVING PHOTORESIST | DONGJIN SEMICHEM CO., LTD. (KR) | 2005-04-28 | — | — | WO | claimed |
| WO-1994024215-A1 | PAINT SOLVENT FORMULATIONS AND METHODS OF USE | THE AMERICAN COLOR COMPANY, INC. (US) | 1994-10-27 | — | — | WO | claimed |
| US-12638772-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-26 | — | — | US | disclosed |
| US-12631964-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| WO-2026100268-A1 | NEGATIVE PHOTOSENSITIVE FILM, MULTILAYER FILM, DRY FILM, AND NEGATIVE PHOTOSENSITIVE COMPOSITION | 東京応化工業株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-20250333565-A1 | CHEMICAL-RESISTANT PROTECTIVE FILM | NISSAN CHEMICAL CORPORATION (JP) | 2025-10-30 | — | — | US | disclosed |
| EP-4632026-A1 | COMPOSITION FOR FORMING PROTECTIVE FILM | Nissan Chemical Corporation (JP) | 2025-10-15 | — | — | EP | disclosed |
| US-12437994-B2 | Protective film-forming composition containing diol structure | NISSAN CHEMICAL CORPORATION (JP) | 2025-10-07 | — | — | US | disclosed |
| EP-4623013-A1 | CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2025-10-01 | — | — | EP | disclosed |
| CN-1384158-A | Resin material for decoration and sweller for deterging and eliminating the resin material | HIPRAY CORP (US) | 2002-12-11 | — | — | CN | disclosed |
| EP-0853116-B1 | Detergent composition for removing resinous stains | KAO CORP (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-5954891-A | ANTISOILANTS OF NONIONIC DETERGENTS ADHERED USING THE DETERGENT COMPOSITION AS DEFINED IN CLAIM 1 OR 2; | KAO CORPORATION (JP) | 1999-09-21 | — | — | US | disclosed |
| US-5834603-A | Polymerization initiator composition | NIPPOH CHEMICALS CO., LTD. (JP) | 1998-11-10 | — | — | US | disclosed |
| EP-0853116-A1 | Detergent composition for removing resinous stains | KAO CORPORATION (JP) | 1998-07-15 | — | — | EP | disclosed |
| US-5609678-A | Paint solvent with glycol ether, oxidizing oil, propylene glycol or propylene carbonate, and NMP or isoalkane | AMERICAN COLOR COMPANY (US) | 1997-03-11 | — | — | US | disclosed |
| WO-1994024215-A1 | PAINT SOLVENT FORMULATIONS AND METHODS OF USE | THE AMERICAN COLOR COMPANY, INC. (US) | 1994-10-27 | — | — | WO | disclosed |
| EP-0542572-A1 | Negative type radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1993-05-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12638772-B2 | Resist underlayer film-forming composition | RFC2, RFC1, RFC4 | ALDH1A1 2183/4885TSHR 4320/4885LMNA 48/4885 |
| US-12437994-B2 | Protective film-forming composition containing diol structure | DSG1, RAD51, CDH1 | ALDH1A1 1697/4885TSHR 4132/4885LMNA 3219/4885 |
| US-12631964-B2 | Resist underlayer film-forming composition | TET1, OGG1, TET3 | ALDH1A1 2237/4885TSHR 3811/4885LMNA 361/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.