SCHEMBL1337563

SCHEMBL1337563

CC(O)Cc1cccc(-c2ccccc2)c1CC(C)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CD274 Q9NZQ7 4/20 0.47
PDCD1 Q15116 1/20 0.47
KMT2A Q03164 2/20 0.46
FOLH1 Q04609 1/20 0.41
DPP4 P27487 1/20 0.40
ADRB2 P07550 1/20 0.39
MME P08473 1/20 0.37
ACE P12821 1/20 0.37
CPA1 P15085 1/20 0.37
ACE2 Q9BYF1 1/20 0.37
SLC6A2 P23975 2/20 0.37
SLC6A4 P31645 2/20 0.37
KCNH2 Q12809 2/20 0.36
KCNA5 P22460 2/20 0.36
GABRA1 P14867 1/20 0.36
GABRB2 P47870 1/20 0.36
MEN1 O00255 1/20 0.36
ALDH1A1 P00352 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
PTGER1 P34995 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5272384 0.85 KMT2A (0.61) CD274PDCD1KMT2AFOLH1DPP4
SCHEMBL2416595 0.82 GABRA1 (0.47) CD274PDCD1KMT2AFOLH1DPP4
SCHEMBL9546806 0.81 GABRA1 (0.46) SLC6A2SLC6A4GABRA1GABRB2ALDH1A1
SCHEMBL4375768 0.80 KMT2A (0.53) CD274PDCD1KMT2ADPP4ADRB2
SCHEMBL9465676 0.79 CD274 (0.43) CD274PDCD1KMT2AFOLH1DPP4
SCHEMBL1338597 0.77 CD274 (0.41) CD274PDCD1KMT2AFOLH1DPP4
SCHEMBL1338130 0.76 CD274 (0.40) CD274PDCD1KMT2AFOLH1DPP4
SCHEMBL5988255 0.74 GABRA1 (0.46) SLC6A2SLC6A4GABRA1GABRB2ALDH1A1
SCHEMBL9465943 0.74 KMT2A (0.45) CD274PDCD1KMT2AFOLH1MME
SCHEMBL2870992 0.74 KMT2A (0.47) KMT2ADPP4MMEACECPA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0267761-A2 Preparation process of 4,4'-dihydroxybiphenyl KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) 1988-05-18 EP claimed
US-20230272156-A1 CURABLE RESIN, CURABLE RESIN COMPOSITION, AND CURED PRODUCT DIC CORPORATION (JP) 2023-08-31 US disclosed
US-8703845-B2 Curable resin composition, cured product thereof, phenolic resin, epoxy resin, and semiconductor sealing material DIC CORPORATION (JP) 2014-04-22 US disclosed
US-20130237639-A1 CURABLE RESIN COMPOSITION, CURED PRODUCT THEREOF, PHENOLIC RESIN, EPOXY RESIN, AND SEMICONDUCTOR SEALING MATERIAL DIC CORPORATION (JP) 2013-09-12 US disclosed
EP-2623535-A1 CURABLE RESIN COMPOSITION, SUBSTANCE RESULTING FROM CURING SAME, PHENOL RESIN, EPOXY RESIN, AND SEMICONDUCTOR SEALING MATERIAL DIC Corporation (JP) 2013-08-07 EP disclosed
US-8263714-B2 Epoxy resin composition, cured article thereof, semiconductor sealing material, novel phenol resin, novel epoxy resin, method for producing novel phenol resin, and method for producing novel epoxy resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2012-09-11 US disclosed
US-20110275739-A1 EPOXY RESIN COMPOSITION, CURED ARTICLE THEREOF, SEMICONDUCTOR SEALING MATERIAL, NOVEL PHENOL RESIN, NOVEL EPOXY RESIN, METHOD FOR PRODUCING NOVEL PHENOL RESIN, AND METHOD FOR PRODUCING NOVEL EPOXY RESIN DAINIPPON INK AND CHEMICALS, INC. (JP) 2011-11-10 US disclosed
US-7985822-B2 Epoxy resin cured with phenol-formaldehyde resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2011-07-26 US disclosed
EP-1785441-B1 EPOXY RESIN COMPOSITION, PRODUCTS OF CURING THEREOF, MATERIAL FOR THE ENCAPSULATION OF SEMICONDUCTORS, NOVEL PHENOL RESIN, NOVEL EPOXY RESIN, PROCESS FOR PRODUCTION OF NOVEL PHENOL RESIN AND PROCESS FOR PRODUCTION OF NOVEL EPOXY RESIN DAINIPPON INK & CHEMICALS (JP) 2011-06-08 EP disclosed
US-20080255315-A1 Epoxy Resin Composition,Cured Article Thereof, Semiconductor Sealing Material, Novel Phenol Resin, Novel Epoxy Resin,Method for Producing Novel Phenol Resin, And Method For Producing Novel Epoxy Resin DAINIPPON INK AND CHEMICALS, INC. (JP) 2008-10-16 US disclosed
EP-1785441-A1 EPOXY RESIN COMPOSITION, PRODUCTS OF CURING THEREOF, MATERIAL FOR THE ENCAPSULATION OF SEMICONDUCTORS, NOVEL PHENOL RESIN, NOVEL EPOXY RESIN, PROCESS FOR PRODUCTION OF NOVEL PHENOL RESIN AND PROCESS FOR PRODUCTION OF NOVEL EPOXY RESIN DAINIPPON INK AND CHEMICALS, INC. (JP) 2007-05-16 EP disclosed