Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2739880 | 0.86 | CHRM2 (0.32) | — | |
| SCHEMBL26349569 | 0.84 | ALDH1A1 (0.33) | ALDH1A1TSHR | |
| SCHEMBL18029787 | 0.82 | CHRM2 (0.30) | — | |
| SCHEMBL68324 | 0.81 | GPX4 (0.32) | ALDH1A1 | |
| SCHEMBL15279602 | 0.81 | — | — | |
| SCHEMBL12914687 | 0.80 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL22200980 | 0.80 | MAPT (0.40) | ALDH1A1TSHRTHRB | |
| SCHEMBL13385125 | 0.80 | TSHR (0.31) | ALDH1A1TSHR | |
| SCHEMBL15356247 | 0.78 | ALDH1A1 (0.43) | ALDH1A1TSHRTHRB | |
| SCHEMBL2740750 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20200218154-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| US-9023580-B2 | Method of forming polymeric compound, resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20130137049-A1 | METHOD OF FORMING POLYMERIC COMPOUND, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-30 | — | — | US | disclosed |
| US-7695889-B2 | Copolymer for semiconductor lithography and process for production thereof | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-04-13 | — | — | US | disclosed |
| US-7695889-B2 | Copolymer for semiconductor lithography and process for production thereof | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-04-13 | — | — | US | disclosed |