SCHEMBL13398802

SCHEMBL13398802

CC(C)(C)C(C)(C)SC(=S)n1cccn1

nearest known ligand 0.63

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
FBP1 P09467 1/20 0.63
NOS1 P29475 6/20 0.37
ELANE P08246 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1959446 0.79 FBP1 (0.55) FBP1NOS1ELANE
SCHEMBL4295861 0.78 FBP1 (1.00) FBP1NOS1ELANE
SCHEMBL13398577 0.76 FBP1 (0.50) FBP1NOS1ELANE
SCHEMBL18217965 0.75
SCHEMBL13398580 0.72 FBP1 (0.46) FBP1NOS1ELANE
SCHEMBL27706091 0.71
SCHEMBL1273779 0.67 FBP1 (0.62) FBP1NOS1ELANE
SCHEMBL16904645 0.67 FBP1 (0.56) FBP1NOS1ELANE
SCHEMBL1868724 0.65
SCHEMBL881140 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20100104974-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2010-04-29 US disclosed
US-20100104974-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2010-04-29 US disclosed