Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FBP1 | P09467 | 1/20 | 0.55 |
| ▸ | NOS1 | P29475 | 4/20 | 0.35 |
| ▸ | ELANE | P08246 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13398802 | 0.79 | FBP1 (0.63) | FBP1NOS1ELANE | |
| SCHEMBL13398577 | 0.73 | FBP1 (0.50) | FBP1NOS1ELANE | |
| SCHEMBL162985 | 0.73 | FBP1 (0.46) | FBP1 | |
| SCHEMBL18217965 | 0.72 | — | — | |
| SCHEMBL4295861 | 0.72 | FBP1 (1.00) | FBP1NOS1ELANE | |
| SCHEMBL25412659 | 0.71 | FBP1 (0.56) | FBP1NOS1ELANE | |
| SCHEMBL14457383 | 0.70 | CYP19A1 (0.39) | — | |
| SCHEMBL13398580 | 0.70 | FBP1 (0.46) | FBP1NOS1ELANE | |
| SCHEMBL11239431 | 0.67 | NOS1 (0.35) | FBP1NOS1ELANE | |
| SCHEMBL11239426 | 0.67 | NOS1 (0.35) | FBP1NOS1ELANE |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170298026-A1 | ALL PURPOSE RAFT AGENT | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2017-10-19 | — | — | US | disclosed |
| US-20170298026-A1 | ALL PURPOSE RAFT AGENT | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2017-10-19 | — | — | US | disclosed |
| US-20170298026-A1 | ALL PURPOSE RAFT AGENT | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2017-10-19 | — | — | US | disclosed |
| EP-3204353-A1 | ALL PURPOSE RAFT AGENT | Commonwealth Scientific and Industrial Research Organisation (AU) | 2017-08-16 | — | — | EP | disclosed |
| WO-2016054689-A1 | ALL PURPOSE RAFT AGENT | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2016-04-14 | — | — | WO | disclosed |
| WO-2016054689-A1 | ALL PURPOSE RAFT AGENT | COMMONWEALTH SCIENTIFIC AND INDUSTRIAL RESEARCH ORGANISATION (AU) | 2016-04-14 | — | — | WO | disclosed |
| US-8614283-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2013-12-24 | — | — | US | disclosed |
| US-8241829-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2012-08-14 | — | — | US | disclosed |
| US-8049042-B2 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2011-11-01 | — | — | US | disclosed |
| US-20110144295-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2011-06-16 | — | — | US | disclosed |
| US-20100104974-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-04-29 | — | — | US | disclosed |
| US-20100104974-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-04-29 | — | — | US | disclosed |
| US-7695892-B2 | Resist composition and pattern-forming method using same | FUJIFILM CORPORATION (JP) | 2010-04-13 | — | — | US | disclosed |
| US-7695892-B2 | Resist composition and pattern-forming method using same | FUJIFILM CORPORATION (JP) | 2010-04-13 | — | — | US | disclosed |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | MITSUBISHI RAYON CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20080241737-A1 | RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241737-A1 | RESIST COMPOSITION AND PATTERN-FORMING METHOD USING SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| EP-1641848-B1 | PHOTORESIST POLYMER COMPOSITIONS | JSR CORP (JP) | 2007-08-22 | — | — | EP | disclosed |
| US-20070190449-A1 | Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer | MITSUBISHI RAYON CO., LTD. (JP) | 2007-08-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170298026-A1 | ALL PURPOSE RAFT AGENT | NPC1L1, RFTN1, SGMS2 | FBP1 4001/4885NOS1 3429/4885ELANE 1008/4885 |
| US-20090198065-A1 | RESIST POLYMER, RESIST COMPOSITION, PROCESS FOR PATTERN FORMATION, AND STARTING COMPOUNDS FOR PRODUCTION OF THE RESIST POLYMER | CHRM1, CHRM2, PKN2 | FBP1 4881/4885NOS1 698/4885ELANE 2520/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.