SCHEMBL13406739

SCHEMBL13406739

COOSOCCOCCN(CCOCCOS(C)(=O)=O)c1ccccc1

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ PPARG P37231 1/20 0.31
▸ F2 P00734 1/20 0.30
▸ PRSS1 P07477 1/20 0.30
▸ PRSS2 P07478 1/20 0.30
▸ PRSS3 P35030 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14421026 0.86 TSHR (0.36) PPARG
SCHEMBL13406734 0.83 MEN1 (0.35) —
SCHEMBL13406732 0.81 KDM4E (0.33) —
SCHEMBL13406733 0.79 KDM4E (0.32) —
SCHEMBL8872313 0.76 RORC (0.34) —
SCHEMBL14129693 0.72 KDM4E (0.33) —
SCHEMBL13338130 0.71 EGFR (0.48) —
SCHEMBL25399798 0.70 USP2 (0.40) PPARG
SCHEMBL11864901 0.70 USP2 (0.40) PPARG
SCHEMBL13226693 0.69 TSHR (0.47) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7691560-B2 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-04-06 — — US disclosed
US-20070224539-A1 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
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