SCHEMBL13406734

SCHEMBL13406734

COOSOCCOCCN(CCOCCOS(C)(=O)=O)CCOc1ccccc1

nearest known ligand 0.36

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 3/20 0.35
▸ KMT2A Q03164 3/20 0.35
▸ KDM4E B2RXH2 2/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ LTA4H P09960 2/20 0.34
▸ TSHR P16473 2/20 0.34
▸ HTT P42858 2/20 0.34
▸ CYP1A2 P05177 1/20 0.34
▸ CYP2D6 P10635 1/20 0.34
▸ CYP2C9 P11712 1/20 0.34
▸ CYP2C19 P33261 1/20 0.34
▸ ABCB1 P08183 1/20 0.32
▸ BCHE P06276 1/20 0.32
▸ ACHE P22303 1/20 0.32
▸ KCNH2 Q12809 1/20 0.32
▸ CA1 P00915 2/20 0.32
▸ CA2 P00918 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14421028 0.87 KDM4E (0.43) MEN1KMT2AKDM4ESMN1; SMN2LTA4H
SCHEMBL13406732 0.86 KDM4E (0.33) KDM4ETSHR
SCHEMBL13406739 0.83 PPARG (0.31) —
SCHEMBL13406733 0.77 KDM4E (0.32) KDM4ETSHR
SCHEMBL13406740 0.77 LTA4H (0.36) LTA4HTSHRHTTCYP1A2CYP2D6
SCHEMBL3939161 0.76 PKM (0.47) MEN1KMT2AKDM4EHTT
SCHEMBL10391332 0.73 KCNA3 (0.48) MEN1KMT2AKDM4ELTA4HTSHR
SCHEMBL13439615 0.72 LTA4H (0.49) MEN1KMT2AKDM4ESMN1; SMN2LTA4H
SCHEMBL13406719 0.72 KCNA3 (0.52) MEN1KMT2AKDM4ESMN1; SMN2LTA4H
SCHEMBL7976554 0.72 KCNA3 (0.52) MEN1KMT2ALTA4HHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7691560-B2 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2010-04-06 — — US disclosed
US-20070224539-A1 Resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2007-09-27 — — US disclosed
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