SCHEMBL13414778

SCHEMBL13414778

C=C(CC)C(=O)OC(CCCC)C(C)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.37

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
CA2 P00918 6/20 0.37
CA1 P00915 3/20 0.37
MAPK1 P28482 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13414800 0.91
SCHEMBL13414779 0.85
SCHEMBL13414784 0.84
SCHEMBL13414792 0.80
SCHEMBL13414783 0.79 XPO1 (0.30)
SCHEMBL13414806 0.78 CA2 (0.34) CA2CA1MAPK1
SCHEMBL13414787 0.75
SCHEMBL13414797 0.74 PRSS1 (0.32) CA2CA1
SCHEMBL4886085 0.74 FAAH (0.42) CA2CA1MAPK1
SCHEMBL16553065 0.73 TSHR (0.42) CA2CA1MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7687228-B2 Antireflection film composition and patterning process using the same SHIN ETSU CHEMICAL CO., LTD. (JP) 2010-03-30 US disclosed
US-20080220381-A1 Antireflection film composition and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-09-11 US disclosed