⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10247951 | 1.00 | — | — | |
| SCHEMBL15247756 | 0.87 | — | — | |
| SCHEMBL10248040 | 0.87 | PKM (0.34) | — | |
| SCHEMBL19036866 | 0.87 | PKM (0.34) | — | |
| SCHEMBL10247948 | 0.84 | — | — | |
| SCHEMBL10256509 | 0.81 | — | — | |
| SCHEMBL9916132 | 0.79 | SMN1; SMN2 (0.33) | — | |
| SCHEMBL14231353 | 0.75 | — | — | |
| SCHEMBL13188775 | 0.74 | — | — | |
| SCHEMBL14469950 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1764649-B1 | Positive resist composition and pattern forming method using the same | FUJIFILM CORP (JP) | 2014-11-12 | — | — | EP | disclosed |
| EP-2637063-A2 | Pattern forming method | Fujifilm Corporation (JP) | 2013-09-11 | — | — | EP | disclosed |
| US-7687219-B2 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2010-03-30 | — | — | US | disclosed |
| US-7687219-B2 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2010-03-30 | — | — | US | disclosed |
| US-20070105045-A1 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM CORPORATION | 2007-05-10 | — | — | US | disclosed |
| US-20070105045-A1 | Positive resist composition and pattern formation method using the positive resist composition | FUJIFILM CORPORATION | 2007-05-10 | — | — | US | disclosed |