SCHEMBL10248040

SCHEMBL10248040

CCC(C)(C)[C@H](O)OC12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.41

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.34
HSD11B1 P28845 2/20 0.33
MDH1 P40925 1/20 0.32
MDH2 P40926 1/20 0.32
DPP4 P27487 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19036866 1.00 PKM (0.34) PKMHSD11B1MDH1MDH2DPP4
SCHEMBL13416367 0.87
SCHEMBL10247951 0.87
SCHEMBL10247773 0.85 PKM (0.32) PKMHSD11B1DPP4
SCHEMBL9916132 0.84 SMN1; SMN2 (0.33)
SCHEMBL14492480 0.83 PKM (0.31) PKMHSD11B1
SCHEMBL15247761 0.82
SCHEMBL15247756 0.78
SCHEMBL13344887 0.77 MDH1 (0.33) PKMMDH1MDH2
SCHEMBL15830884 0.77 DPP8 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120076996-A1 RESIST COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-03-29 US disclosed