SCHEMBL1341695

SCHEMBL1341695

CC(=O)OCCOCC(C)OCCOC(C)=O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.52
TSHR P16473 3/20 0.52
TDP1 Q9NUW8 2/20 0.41
CHRM1 P11229 3/20 0.38
CHRM5 P08912 2/20 0.38
CHRM3 P20309 2/20 0.38
CHRM2 P08172 2/20 0.38
CHRM4 P08173 2/20 0.38
TBXA2R P21731 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
PGR P06401 1/20 0.38
HTR1A P08908 1/20 0.38
CHRNB2 P17787 1/20 0.38
CHRNB4 P30926 1/20 0.38
CHRNA3 P32297 1/20 0.38
CHRNA7 P36544 1/20 0.38
CHRNA4 P43681 1/20 0.38
CHRNA10 Q9GZZ6 1/20 0.38
CHRNA9 Q9UGM1 1/20 0.38
ALOX15 P16050 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propene SCHEMBL19409471 0.91 TSHR (0.44) ALDH1A1TSHRTDP1CHRM1CHRM5
SCHEMBL30884809 0.89 ALDH1A1 (0.59) ALDH1A1TSHRTDP1CHRM1CHRM5
SCHEMBL4866703 0.88 ALDH1A1 (0.55) ALDH1A1TSHRTDP1ALOX15LMNA
SCHEMBL4140289 0.84 TDP1 (0.41) ALDH1A1TSHRTDP1HSD17B10
SCHEMBL10816929 0.83 ALDH1A1 (0.43) ALDH1A1TSHRTDP1CHRM1CHRM5
SCHEMBL25701625 0.82 TDP1 (0.44) ALDH1A1TSHRTDP1HSD17B10
SCHEMBL1450823 0.82 ALDH1A1 (0.55) ALDH1A1TSHRCHRM1CHRM5CHRM3
SCHEMBL169664 0.82 THRB (0.58) ALDH1A1TSHRTDP1THRBHTT
SCHEMBL29613043 0.82 ALDH1A1 (0.54) ALDH1A1TSHRTDP1CHRM1CHRM5
SCHEMBL1476532 0.81 ALDH1A1 (0.58) ALDH1A1TSHRTDP1CHRM1CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8062825-B2 Positive resist composition and resist pattern forming method TOKYO OHKA KOGYO CO., LTD. (JP) 2011-11-22 US disclosed
US-20090075177-A1 POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2009-03-19 US disclosed
CN-101208083-A Treatment with statin and Omega-3 fatty acids and a combination product thereof RELIANT PHARMACEUTICALS INC (US) 2008-06-25 CN disclosed
US-20060154188-A1 Immersion fluid for use in liquid immersion lithography and method of forming resist pattern using the immersion fluid TOKYO OHKA KOGYO CO., LTD. (JP) 2006-07-13 US disclosed