SCHEMBL134205

SCHEMBL134205

NCc1cccc2cc3ccccc3cc12

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 1/20 0.54
ALDH1A1 P00352 4/20 0.46
KDM4E B2RXH2 2/20 0.46
GAA P10253 2/20 0.46
MEN1 O00255 1/20 0.42
MAPT P10636 1/20 0.42
KMT2A Q03164 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
PNMT P11086 2/20 0.41
LOXL2 Q9Y4K0 3/20 0.40
HIF1A Q16665 2/20 0.39
HSD17B10 Q99714 2/20 0.39
CYP1B1 Q16678 1/20 0.39
DPP4 P27487 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CA2 P00918 1/20 0.38
CYP1A2 P05177 2/20 0.38
CYP2C9 P11712 1/20 0.38
CYP2C19 P33261 1/20 0.38
CYP3A4 P08684 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21634588 0.91 HTR2A (0.52) HTR2AALDH1A1KDM4EGAAPNMT
SCHEMBL30553971 0.83 TAAR1 (0.47) HTR2AALDH1A1KDM4EGAAMEN1
SCHEMBL3717317 0.83 TAAR1 (0.47) HTR2AALDH1A1KDM4EGAAMEN1
Methacrylic Acid SCHEMBL29224024 0.82 KDM4E (0.44) HTR2AALDH1A1KDM4EGAAMEN1
SCHEMBL9858830 0.82 ALDH1A1 (0.44) HTR2AALDH1A1KDM4EGAAMEN1
SCHEMBL31612920 0.82 TAAR1 (0.45) HTR2AALDH1A1KDM4EGAAMEN1
SCHEMBL25416888 0.80 HTR2A (0.68) HTR2AALDH1A1KDM4EGAAMAPT
SCHEMBL25543454 0.80 TLR8 (0.46) HTR2AALDH1A1KDM4EGAAMEN1
SCHEMBL5354692 0.80 ALDH1A1 (0.42) HTR2AALDH1A1KDM4EGAAMEN1
SCHEMBL27948024 0.80 HTR2A (0.43) HTR2AALDH1A1KDM4EGAAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 180 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120122391-A Photosensitive resin composition containing photobleachable aminomethylanthracene photosensitizer and application thereof 湖南初源新材料股份有限公司 2025-06-10 CN claimed
CN-113278153-B Polymer, process for producing the same and process for depolymerizing the same 北京大学 2024-07-12 CN claimed
CN-113278153-A Polymer, method for producing same, and depolymerization method 北京大学 2021-08-20 CN claimed
WO-2010112946-A1 ADAMANTANE BISUREA DERIVATIVES, METHOD OF PREPARATION AND APPLICATION IN ANION SENSING RUDJER BOSKOVIC INSTITUTE (HR) 2010-10-07 WO claimed
US-6974665-B2 In situ screening to optimize variables in organic reactions UNIVERSITY OF NEBRASKA (US) 2005-12-13 US claimed
US-20030148257-A1 In situ screening to optimize variables in organic reactions UNIVERSITY OF NEBRASKA (US) 2003-08-07 US claimed
CN-120122391-B Photosensitive resin composition containing photobleachable aminomethylanthracene photosensitizer and application thereof 湖南初源新材料股份有限公司 2025-07-29 CN disclosed
CN-120122391-B Photosensitive resin composition containing photobleachable aminomethylanthracene photosensitizer and application thereof 湖南初源新材料股份有限公司 2025-07-29 CN disclosed
CN-120122391-A Photosensitive resin composition containing photobleachable aminomethylanthracene photosensitizer and application thereof 湖南初源新材料股份有限公司 2025-06-10 CN disclosed
CN-120122391-A Photosensitive resin composition containing photobleachable aminomethylanthracene photosensitizer and application thereof 湖南初源新材料股份有限公司 2025-06-10 CN disclosed
CN-120122391-A Photosensitive resin composition containing photobleachable aminomethylanthracene photosensitizer and application thereof 湖南初源新材料股份有限公司 2025-06-10 CN disclosed
CN-113278153-B Polymer, process for producing the same and process for depolymerizing the same 北京大学 2024-07-12 CN disclosed
CN-118084813-A Macrocyclic compounds 诺和诺德牛津研究中心有限公司 2024-05-28 CN disclosed
US-20030060579-A1 Catalyst component for addition polymerization, process for producing catalyst for addition polymerization and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-03-27 US disclosed
EP-1275662-A1 MODIFIED PARTICLE, SUPPORT, CATALYST COMPONENT FOR ADDITION POLYMERIZATION, CATALYST FOR ADDITION POLYMERIZATION, AND PROCESS FOR PRODUCING ADDITION POLYMER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-01-15 EP disclosed
US-20020143124-A1 Homogeneous type solid catalyst component or homogeneous type solid catalyst, process for production thereof and process for producing addition polymer with the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-10-03 US disclosed
US-20010020075-A1 Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-09-06 US disclosed
EP-1113026-A2 Catalyst component for addition polymerization, catalyst for addition polymerization, and process for producing addition polymer SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-04 EP disclosed
US-4937292-A Photosensitizer Solavchem Enterprises Inc. 1990-06-26 US disclosed
EP-0373687-A1 Method for the photochemical conversion of tachysterol compounds into previtamin D compounds and of trans-vitamin D compounds into cis-vitamin D compounds DUPHAR INTERNATIONAL RESEARCH B.V (NL) 1990-06-20 EP disclosed