SCHEMBL13430299

SCHEMBL13430299

CCC(C)(F)C(=O)OC(C1CCCCC1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PDK1 Q15118 1/20 0.34
PDK2 Q15119 1/20 0.34
PDK3 Q15120 1/20 0.34
PDK4 Q16654 1/20 0.34
CHRM2 P08172 4/20 0.32
CHRM4 P08173 4/20 0.32
CHRM1 P11229 4/20 0.32
CHRM3 P20309 4/20 0.32
SSTR4 P31391 1/20 0.31
HSD11B1 P28845 1/20 0.31
ALDH1A1 P00352 1/20 0.30
MAPT P10636 1/20 0.30
LIPA P38571 1/20 0.30
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30
EPHX1 P07099 1/20 0.30
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13430274 0.88 PDK1 (0.34) PDK1PDK2PDK3PDK4CHRM2
SCHEMBL13385934 0.86 PDK1 (0.33) PDK1PDK2PDK3PDK4CHRM2
SCHEMBL14556945 0.85 LIPA (0.32) MAPTLIPA
SCHEMBL10115796 0.84 PDK1 (0.34) PDK1PDK2PDK3PDK4CHRM2
SCHEMBL18802874 0.83 CHRM2 (0.33) PDK1PDK2PDK3PDK4CHRM2
SCHEMBL12753206 0.76 PDK1 (0.37) PDK1PDK2PDK3PDK4CHRM2
SCHEMBL25917462 0.74 LIPA (0.33) MAPTLIPA
SCHEMBL12129825 0.74 LIPA (0.33) LIPA
SCHEMBL15281555 0.74 APOBEC3A (0.30)
SCHEMBL2680728 0.73 EPHX1 (0.47) PDK1PDK2PDK3PDK4CHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8871421-B2 Positive resist composition and method of pattern formation with the same FUJIFILM CORPORATION (JP) 2014-10-28 US disclosed
US-8389200-B2 Pattern forming method FUJIFILM CORPORATION (JP) 2013-03-05 US disclosed
US-20100068661-A1 PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2010-03-18 US disclosed
US-20080305433-A1 POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME FUJIFILM CORPORATION (JP) 2008-12-11 US disclosed
US-20070178405-A1 Positive resist composition and method of pattern formation with the same FUJI PHOTO FILM CO., LTD. 2007-08-02 US disclosed