SCHEMBL13445841

SCHEMBL13445841

CC1(COCCl)CC2CCC1C2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALOX5AP P20292 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14931210 0.89 ALOX5AP (0.31) ALOX5AP
SCHEMBL10305805 0.84
SCHEMBL12972057 0.82 ALOX5AP (0.34) ALOX5AP
SCHEMBL19188608 0.81
SCHEMBL4387181 0.79 ALOX5AP (0.30) ALOX5AP
SCHEMBL14617227 0.72
SCHEMBL14617211 0.72
SCHEMBL3294812 0.71 GRIN2D (0.34)
SCHEMBL3687706 0.71 ALOX5AP (0.35) ALOX5AP
SCHEMBL3694984 0.70 ALDH1A1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7687222-B2 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-30 US disclosed
US-7687222-B2 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-30 US disclosed
US-20080008962-A1 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-01-10 US disclosed
US-20080008962-A1 Polymerizable ester compounds, polymers, resist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-01-10 US disclosed