SCHEMBL1345231

SCHEMBL1345231

CCCc1ccc(O)c(Cc2cc(CCC)cc(Cc3cc(CCC)ccc3O)c2O)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CNR1 P21554 1/20 0.56
CNR2 P34972 1/20 0.56
AMY1A P0DUB6 1/20 0.53
ALOX5 P09917 2/20 0.53
BACE1 P56817 1/20 0.50
HIF1A Q16665 4/20 0.49
CYP2C9 P11712 1/20 0.49
CYP2C19 P33261 1/20 0.49
GABRA1 P14867 2/20 0.42
GABRB2 P47870 2/20 0.42
MAPT P10636 3/20 0.41
CYP3A4 P08684 2/20 0.41
ALOX15 P16050 2/20 0.41
LMNA P02545 2/20 0.41
HPGD P15428 2/20 0.41
BLM P54132 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
MEN1 O00255 1/20 0.41
SLC22A1 O15245 1/20 0.41
USP2 O75604 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1346224 1.00 CNR1 (0.56) CNR1CNR2AMY1AALOX5BACE1
SCHEMBL1343520 1.00 CNR1 (0.56) CNR1CNR2AMY1AALOX5BACE1
SCHEMBL1345508 1.00 CNR1 (0.56) CNR1CNR2AMY1AALOX5BACE1
SCHEMBL1345317 1.00 CNR1 (0.56) CNR1CNR2AMY1AALOX5BACE1
SCHEMBL51035 0.93 CNR1 (0.64) CNR1CNR2AMY1AALOX5BACE1
SCHEMBL16240332 0.88 ALOX5 (0.47) CNR1CNR2AMY1AALOX5BACE1
SCHEMBL9913999 0.87 CNR1 (0.58) CNR1CNR2AMY1AALOX5BACE1
SCHEMBL27735003 0.87 KAT8 (0.54) AMY1AHIF1ACYP3A4LMNAHPGD
SCHEMBL27755447 0.87 KAT8 (0.54) AMY1AHIF1ACYP3A4LMNAHPGD
SCHEMBL27755448 0.87 KAT8 (0.54) AMY1AHIF1ACYP3A4LMNAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1724119-B1 DEVELOPER MIXTURE FOR THERMAL RECORDING MATERIALS AND THERMAL RECORDING MATERIALS MITSUBISHI CHEM CORP (JP) 2014-11-19 EP disclosed
US-8062993-B2 Developer mixture for thermal recording materials and thermal recording materials API CORPORATION (JP) 2011-11-22 US disclosed
US-20070173407-A1 Developer mixture for thermal recording materials and thermal recording materials API CORPORATION (JP) 2007-07-26 US disclosed
EP-1724119-A1 DEVELOPER MIXTURE FOR THERMAL RECORDING MATERIALS AND THERMAL RECORDING MATERIALS API Corporation (JP) 2006-11-22 EP disclosed